CAJ | 학술논문

采用短波紫外光(UV)对十八烷基j氯硅烷(OTS)自组装单分子层(SAMs)进行刻蚀,利用化学液相法在OTS-SAMs模板表面制备出铁酸铋(BiFeO_3)图案化薄膜.通过接触角、X射线衍射(XRD)、扫描电镜(SEM)、X射线能谱(EDS)等测试手段对OTS膜和BiFeO_3薄膜进行表征.结果表明:以OTS为模板利用化学液相法成功制备出边缘轮廓清晰、条纹宽度为10-20 μm的BiFeO_3图案化薄膜.
채용단파자외광(UV)대십팔완기j록규완(OTS)자조장단분자층(SAMs)진행각식,이용화학액상법재OTS-SAMs모판표면제비출철산필(BiFeO_3)도안화박막.통과접촉각、X사선연사(XRD)、소묘전경(SEM)、X사선능보(EDS)등측시수단대OTS막화BiFeO_3박막진행표정.결과표명:이OTS위모판이용화학액상법성공제비출변연륜곽청석、조문관도위10-20 μm적BiFeO_3도안화박막.
Different kinds of micro-patterns were fabricated within octadecyhrichlorosilane (OTS) self-assembled monolayers(SAMs) utilizing UV lithography. The BiFeO_3 pattern films have been formed on silanol SAMs by the chemical solution deposition(CSD). The crystal phase composition, microstructure and topography of the as-prepared films were characterized by contact angle tester, X-ray diffraction (XRD), scanning electron microscopy (SEM) and energy disperse spectroscopy (EDS). The large contrast between octadecyl regions and silanol regions suggests selective deposition of BiFeO_3 film on the silanol regions with deposited line width of 10-20 μm.