半导体学报
半導體學報
반도체학보
CHINESE JOURNAL OF SEMICONDUCTORS
2002年
8期
794-799
,共6页
张世斌%孔光临%徐艳月%王永谦%刁宏伟%廖显伯
張世斌%孔光臨%徐豔月%王永謙%刁宏偉%廖顯伯
장세빈%공광림%서염월%왕영겸%조굉위%료현백
非晶硅%瞬态光电导%光致变化
非晶硅%瞬態光電導%光緻變化
비정규%순태광전도%광치변화
amorphous silicon%transient photoconductivity%light-induced change
研究了非晶硅薄膜的瞬态光电导的光致变化情况.用通常的非晶态半导体的瞬态光电流的乘方规律和稳态光电导的扩展指数规律都不能对试验数据进行很好的拟合,而采用两个指数函数相加的形式可以对实验数据进行很好的拟合.这表明非晶硅薄膜长时间的衰退不是由带尾态决定,而是由深的陷阱决定的.两个指数函数的衰退分别对应于距导带0.52eV和0.59eV的两个陷阱,这两个陷阱可以被指认为带隙中的荷负电中心.光照后,带隙中的复合中心增加,导致电子寿命的减少,从而引起光电导的衰退.
研究瞭非晶硅薄膜的瞬態光電導的光緻變化情況.用通常的非晶態半導體的瞬態光電流的乘方規律和穩態光電導的擴展指數規律都不能對試驗數據進行很好的擬閤,而採用兩箇指數函數相加的形式可以對實驗數據進行很好的擬閤.這錶明非晶硅薄膜長時間的衰退不是由帶尾態決定,而是由深的陷阱決定的.兩箇指數函數的衰退分彆對應于距導帶0.52eV和0.59eV的兩箇陷阱,這兩箇陷阱可以被指認為帶隙中的荷負電中心.光照後,帶隙中的複閤中心增加,導緻電子壽命的減少,從而引起光電導的衰退.
연구료비정규박막적순태광전도적광치변화정황.용통상적비정태반도체적순태광전류적승방규률화은태광전도적확전지수규률도불능대시험수거진행흔호적의합,이채용량개지수함수상가적형식가이대실험수거진행흔호적의합.저표명비정규박막장시간적쇠퇴불시유대미태결정,이시유심적함정결정적.량개지수함수적쇠퇴분별대응우거도대0.52eV화0.59eV적량개함정,저량개함정가이피지인위대극중적하부전중심.광조후,대극중적복합중심증가,도치전자수명적감소,종이인기광전도적쇠퇴.
Light induced changes in a-Si∶H films are investigated by transient photoconductivity.The transient photoconductivity decay data can neither be fit well by common power-law for transient photocurrent in amorphous semiconductors,nor by stretched exponential rule for transient decay from the steady state in photoconductivity.Instead,the data are fit fairly well with a sum of two exponential functions.The results show that the long time decay is governed by deep traps rather than band tail states,and two different traps locating separately at 0.52 and 0.59eV below Ec are responsible for the two exponential functions.They are designated as negatively charged dangling bond D- centers.The light-induced changes in photoconductivity are attributed mainly to the decrease in electron lifetime caused by the increase of recombination centers after light soaking.