液晶与显示
液晶與顯示
액정여현시
CHINESE JOURNAL OF LIQUID CRYSTALS AND DISPLAYS
2012年
4期
466-471
,共6页
曲连杰%陈旭%郭建%闵泰烨%谢振宇%张文余
麯連傑%陳旭%郭建%閔泰燁%謝振宇%張文餘
곡련걸%진욱%곽건%민태엽%사진우%장문여
薄膜晶体管液晶显示器%触摸屏%透过率%氮化硅
薄膜晶體管液晶顯示器%觸摸屏%透過率%氮化硅
박막정체관액정현시기%촉모병%투과솔%담화규
TFT LCD%touch sensor%transmittance%silicon nitride
研究了氮化硅材料在触摸屏领域中的应用,利用等离子体化学气相沉积技术,在一定厚度的玻璃表面沉积不同厚度的氮化硅薄膜.通过理论分析和试验测试的方法得到了氮化硅膜层厚度和折射率对触摸屏透过率以及表面宏观颜色的影响.分析结果表明,氮化硅膜层折射率对触摸屏的平均透过率影响明显,而膜层厚度对触摸屏的平均透过率影响很小,但是膜层厚度的改变对触摸屏特定波长处透过率和膜层宏观颜色影响很明显.在实际生产中可以通过改变沉积条件获得合适折射率及厚度的氮化硅薄膜材料.
研究瞭氮化硅材料在觸摸屏領域中的應用,利用等離子體化學氣相沉積技術,在一定厚度的玻璃錶麵沉積不同厚度的氮化硅薄膜.通過理論分析和試驗測試的方法得到瞭氮化硅膜層厚度和摺射率對觸摸屏透過率以及錶麵宏觀顏色的影響.分析結果錶明,氮化硅膜層摺射率對觸摸屏的平均透過率影響明顯,而膜層厚度對觸摸屏的平均透過率影響很小,但是膜層厚度的改變對觸摸屏特定波長處透過率和膜層宏觀顏色影響很明顯.在實際生產中可以通過改變沉積條件穫得閤適摺射率及厚度的氮化硅薄膜材料.
연구료담화규재료재촉모병영역중적응용,이용등리자체화학기상침적기술,재일정후도적파리표면침적불동후도적담화규박막.통과이론분석화시험측시적방법득도료담화규막층후도화절사솔대촉모병투과솔이급표면굉관안색적영향.분석결과표명,담화규막층절사솔대촉모병적평균투과솔영향명현,이막층후도대촉모병적평균투과솔영향흔소,단시막층후도적개변대촉모병특정파장처투과솔화막층굉관안색영향흔명현.재실제생산중가이통과개변침적조건획득합괄절사솔급후도적담화규박막재료.
The use of silicon nitride (SiNx) in the field of touch sensor has been investigated.Silicon Nitride (SiNx) with different thickness is deposited on the surface of bare glass by plasma-enhanced chemical vapor deposition technology.Using theoretical analysis and experimental test method,this article illuminates the impact on the touch sensor of transmittance and macro-color caused by film thickness and the refractive index.The results show that the refractive index of SiNx has great impact on the average transmittance,while the film thickness has no obvious effect on it.The film thickness has great impact on transmittance at fixed-wavelength and the macro-color,and it is crucial to the process control.