真空科学与技术学报
真空科學與技術學報
진공과학여기술학보
JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY
2010年
2期
201-204
,共4页
许晓静%宗亮%卓刘成%郝欣妮%陈丹
許曉靜%宗亮%卓劉成%郝訢妮%陳丹
허효정%종량%탁류성%학흔니%진단
钛基材%薄膜%纳米压痕%摩擦磨损%磁控溅射
鈦基材%薄膜%納米壓痕%摩抆磨損%磁控濺射
태기재%박막%납미압흔%마찰마손%자공천사
Titanium substrate%Thin films%Nano-indentation%Friction and wear%Magnetron sputtering
采用室温磁控溅射技术在纳米晶体钛表面制备出CN_x/SiC双层薄膜,SiC为中间层.研究了CN_x薄膜的纳米压痕行为和摩擦磨损性能.试验结果表明:CN_x薄膜的纳米硬度、杨氏弹性模量、硬度与弹性模量比值分别为8.03GPa,55.0GPa和0.146;在200g载荷、氮化硅球(半径为2mm)为对摩件、大气干摩擦条件下,CN_x薄膜的磨损速率为10~(-6)mm~3m~(-1)N~(-1)级,摩擦系数约为0.159,磨损后薄膜未出现裂纹和剥落.分析表明,摩擦系数和摩擦化学有关,良好的抗磨性能和硬度与弹性模量比值较之是相一致的.
採用室溫磁控濺射技術在納米晶體鈦錶麵製備齣CN_x/SiC雙層薄膜,SiC為中間層.研究瞭CN_x薄膜的納米壓痕行為和摩抆磨損性能.試驗結果錶明:CN_x薄膜的納米硬度、楊氏彈性模量、硬度與彈性模量比值分彆為8.03GPa,55.0GPa和0.146;在200g載荷、氮化硅毬(半徑為2mm)為對摩件、大氣榦摩抆條件下,CN_x薄膜的磨損速率為10~(-6)mm~3m~(-1)N~(-1)級,摩抆繫數約為0.159,磨損後薄膜未齣現裂紋和剝落.分析錶明,摩抆繫數和摩抆化學有關,良好的抗磨性能和硬度與彈性模量比值較之是相一緻的.
채용실온자공천사기술재납미정체태표면제비출CN_x/SiC쌍층박막,SiC위중간층.연구료CN_x박막적납미압흔행위화마찰마손성능.시험결과표명:CN_x박막적납미경도、양씨탄성모량、경도여탄성모량비치분별위8.03GPa,55.0GPa화0.146;재200g재하、담화규구(반경위2mm)위대마건、대기간마찰조건하,CN_x박막적마손속솔위10~(-6)mm~3m~(-1)N~(-1)급,마찰계수약위0.159,마손후박막미출현렬문화박락.분석표명,마찰계수화마찰화학유관,량호적항마성능화경도여탄성모량비치교지시상일치적.
The mechanical properties of the CN_x/SiC bilayered coatings,deposited by magnetron sputtering at room temperature on nanocrystal Ti substrates,were studied.The results show that the CN_x film has a nano-hardness of 8.03GPa,a Young modulus of 55.0GPa,and a hardness-to-modulus ratio of 0.146.When sliding against silicon nitride ball,2mm in diameter,under ambient environment at a load of 200g,the friction coefficient of the CN_x film was found to be 0.159,with a specific wear rate up to the magnitude of 10~(-6) mm~3m~(-1)N~(-1),while without observable cracking or peeling off.Possible mechanism was tentatively discussed.