CAJ | 학술논문

采用射频磁控溅射法在玻璃基片上成功制得了GdTbFeCo非晶垂直磁化膜,研究了溅射工艺对GdTbFeCo薄膜磁光性能的影响.测量结果表明,基片与靶间距为72mm,溅射功率为75W,溅射气压为0.5Pa,薄膜厚度为120nm时,GdTbFeCo薄膜垂直方向矫顽力为477.6kA/m,克尔角为0.413°.
채용사빈자공천사법재파리기편상성공제득료GdTbFeCo비정수직자화막,연구료천사공예대GdTbFeCo박막자광성능적영향.측량결과표명,기편여파간거위72mm,천사공솔위75W,천사기압위0.5Pa,박막후도위120nm시,GdTbFeCo박막수직방향교완력위477.6kA/m,극이각위0.413°.
GdTbFeCo magnetic thin films were prepared onto glass substrates by RF magnetron sputtering system. The effect of sputtering parameters on the magneto-optical properties of thin films were investigated. It is found that when the distance between the target and substrates, the sputtering power, sputtering pressure and thickness of the GdTbFeCo thin films are 72mm, 75W,0. 5Pa and 120nm,respectively,the Kerr rotation angle and coercivity that in the perpendicular direction are as high as 0. 413°and 6477. 6kA/m.