CAJ | 학술논문

采用微波等离子体化学气相沉积法在硬质合金基体上制备金刚石薄膜.研究了铜过渡层和酸蚀脱钴两种基体前处理工艺以及在施加铜过渡层的情况下,不同的沉积气压和基片温度对金刚石薄膜的质量的影响.结果表明:在施加铜过渡层后,在适中的沉积条件下(沉积气压6.0 kPa,基片温度约为780℃)可得到质量较好的金刚石薄膜.
채용미파등리자체화학기상침적법재경질합금기체상제비금강석박막.연구료동과도층화산식탈고량충기체전처리공예이급재시가동과도층적정황하,불동적침적기압화기편온도대금강석박막적질량적영향.결과표명:재시가동과도층후,재괄중적침적조건하(침적기압6.0 kPa,기편온도약위780℃)가득도질량교호적금강석박막.
Diamond films were prepared on WC-Co substrates with microwave plasma chemical vapor deposition. The effects of different pretreatments including acid etching and copper interlayer and deposition conditions on the quality of diamond films were studied. The result of this study shows that the quality of diamond film is good with moderate conditions of gas pressure 6.0 kPa and substrate temperature 780 ℃.