物理学报
物理學報
물이학보
2001年
1期
175-181
,共7页
吴广明%王珏%沈军%杨天河%张勤远%周斌%邓忠生%范滨%周东平%张凤山
吳廣明%王玨%瀋軍%楊天河%張勤遠%週斌%鄧忠生%範濱%週東平%張鳳山
오엄명%왕각%침군%양천하%장근원%주빈%산충생%범빈%주동평%장봉산
溶胶-凝胶技术%SiO2薄膜%纳米多孔结构
溶膠-凝膠技術%SiO2薄膜%納米多孔結構
용효-응효기술%SiO2박막%납미다공결구
报道了实验制备条件对纳米多孔SiO2薄膜结构、折射率、红外吸收、XPS等特性的影响，尤其是报道了一种新的快速、方便、有效实现纳米多孔SiO2薄膜折射率连续调节的方法.在溶胶-凝胶基础上，采用碱、酸一步法以及碱/酸两步法和浸渍镀膜技术制备了纳米多孔SiO2薄膜.使用原子力显微镜、扫描电镜、XPS、傅里叶红外光谱仪、椭偏仪等方法测量和分析了薄膜的特性.实验结果给出从碱一步法、碱/酸两步法、到酸一步法形成的薄膜，SiO2颗粒变小，孔隙率降低，折射率从1.18连续增加到1.41；Si2p峰向高束缚能方向移动，并接近块体的值；红外吸收光学模ω4的频率向低波数方向移动，揭示了Si-O-Si键角的不断降低.这些结果表明，碱/酸两步法能方便、有效地连续控制纳米多孔SiO2薄膜的结构；实验条件对薄膜特性的影响起因于纳米多孔结构改变引起的SiO2结构变化.
報道瞭實驗製備條件對納米多孔SiO2薄膜結構、摺射率、紅外吸收、XPS等特性的影響，尤其是報道瞭一種新的快速、方便、有效實現納米多孔SiO2薄膜摺射率連續調節的方法.在溶膠-凝膠基礎上，採用堿、痠一步法以及堿/痠兩步法和浸漬鍍膜技術製備瞭納米多孔SiO2薄膜.使用原子力顯微鏡、掃描電鏡、XPS、傅裏葉紅外光譜儀、橢偏儀等方法測量和分析瞭薄膜的特性.實驗結果給齣從堿一步法、堿/痠兩步法、到痠一步法形成的薄膜，SiO2顆粒變小，孔隙率降低，摺射率從1.18連續增加到1.41；Si2p峰嚮高束縳能方嚮移動，併接近塊體的值；紅外吸收光學模ω4的頻率嚮低波數方嚮移動，揭示瞭Si-O-Si鍵角的不斷降低.這些結果錶明，堿/痠兩步法能方便、有效地連續控製納米多孔SiO2薄膜的結構；實驗條件對薄膜特性的影響起因于納米多孔結構改變引起的SiO2結構變化.
보도료실험제비조건대납미다공SiO2박막결구、절사솔、홍외흡수、XPS등특성적영향，우기시보도료일충신적쾌속、방편、유효실현납미다공SiO2박막절사솔련속조절적방법.재용효-응효기출상，채용감、산일보법이급감/산량보법화침지도막기술제비료납미다공SiO2박막.사용원자력현미경、소묘전경、XPS、부리협홍외광보의、타편의등방법측량화분석료박막적특성.실험결과급출종감일보법、감/산량보법、도산일보법형성적박막，SiO2과립변소，공극솔강저，절사솔종1.18련속증가도1.41；Si2p봉향고속박능방향이동，병접근괴체적치；홍외흡수광학모ω4적빈솔향저파수방향이동，게시료Si-O-Si건각적불단강저.저사결과표명，감/산량보법능방편、유효지련속공제납미다공SiO2박막적결구；실험조건대박막특성적영향기인우납미다공결구개변인기적SiO2결구변화.
The evolution of structure and properties of nano-porous silica films was investigated under different experimental conditions.A new method to adjust refractive index of the films rapidly and continuously is reported.The thin films were prepared with the base,acid one-step and base/acid two-step catalytic sol-gel processes and the dip-coating method.The structure and properties of the films were analyzed by atom force microscopy,scanning electron microscopy,X-ray photo electron spectroscopy,Fourier transform infrared,ellipsometry,separately.From the base one-step,the base/acid two-step,and the acid one-step catalytic process,silica particles in the films become small,the porosity decreases,and the refractive index increases continuously from 1.18 to 1.41.XPS analysis has shown Si2p peak shifts to a higher binding energy and near that of the silica bulk.The frequency shift of ω4 (transverse optical mode) of infrared absorption to a lower wave number indicates a decrease in the average Si-O-Si bridging angle.These results suggest that the effect of the above experimental conditions on properties of nano-porous silica films is attributed to the change of the silica structure of the films.
