功能材料与器件学报
功能材料與器件學報
공능재료여기건학보
JOURNAL OF FUNCTIONAL MATERIALS AND DEVICES
2002年
4期
335-340
,共6页
沈大可%韩高荣%杜丕一%ZHANG X.X%SOU I.K
瀋大可%韓高榮%杜丕一%ZHANG X.X%SOU I.K
침대가%한고영%두비일%ZHANG X.X%SOU I.K
分子束外延%ZnSSe薄膜%光电特性%液晶光阀
分子束外延%ZnSSe薄膜%光電特性%液晶光閥
분자속외연%ZnSSe박막%광전특성%액정광벌
MBE%ZnSSe thin films%opto-electronic properties%LCLV
用分子束外延法(MBE),在铟锡氧化物(ITO)导电玻璃衬底上生长了ZnSSe薄膜,详细研究了薄膜的光电特性.通过控制反应时的生长参数,制备出了符合紫外液晶光阀设计要求的光导层薄膜.室温下,该薄膜光谱响应截止边的响应度为0.01A/W,紫外/可见光响应对比度大于103.薄膜的暗电阻率随薄膜晶粒增大而减小,在衬底温度为2900C时,所获得的ZnSSe薄膜具有4.3×1011Ω@cm的暗电阻率.频率从40Hz到4000Hz的交流特性测试,也证实该薄膜符合器件紫外成像的工作要求.
用分子束外延法(MBE),在銦錫氧化物(ITO)導電玻璃襯底上生長瞭ZnSSe薄膜,詳細研究瞭薄膜的光電特性.通過控製反應時的生長參數,製備齣瞭符閤紫外液晶光閥設計要求的光導層薄膜.室溫下,該薄膜光譜響應截止邊的響應度為0.01A/W,紫外/可見光響應對比度大于103.薄膜的暗電阻率隨薄膜晶粒增大而減小,在襯底溫度為2900C時,所穫得的ZnSSe薄膜具有4.3×1011Ω@cm的暗電阻率.頻率從40Hz到4000Hz的交流特性測試,也證實該薄膜符閤器件紫外成像的工作要求.
용분자속외연법(MBE),재인석양화물(ITO)도전파리츤저상생장료ZnSSe박막,상세연구료박막적광전특성.통과공제반응시적생장삼수,제비출료부합자외액정광벌설계요구적광도층박막.실온하,해박막광보향응절지변적향응도위0.01A/W,자외/가견광향응대비도대우103.박막적암전조솔수박막정립증대이감소,재츤저온도위2900C시,소획득적ZnSSe박막구유4.3×1011Ω@cm적암전조솔.빈솔종40Hz도4000Hz적교류특성측시,야증실해박막부합기건자외성상적공작요구.
The opto-electronic properties of molecular beam epitaxy (MBE)technique grown by ZnSSe thin films on indium-tin-oxide (ITO) glass substrates were investigated. Ultraviolet (UV) photo-responsivity as high as 0.01 A/W and three orders of visible rejection power are demonstrated at room temperature. The results of d.c. resistivity measurements reveal that the dark resistivity of the ZnSSe thin films decreases as the crystal size increases and reaches a value of 4.3× 1011 Ω @ cm for a thin film grown at the optimised substrate temperature, 2900C. The results of a.c. impedance measurements performed in the frequency range of 40Hz to 4000 Hz further indicate that the impedance of this alloy thin film can provide a good matching with the liquid crystal layer of a liquid crystal light valve (LCLV) for UV imaging applications.