等离子体科学和技术(英文版)
等離子體科學和技術(英文版)
등리자체과학화기술(영문판)
PLASMA SCIENCE & TECHNOLOGY
2002年
1期
1113-1118
,共6页
赵庆勋%辛红丽%韩佳宁%文钦若%杨景发
趙慶勛%辛紅麗%韓佳寧%文欽若%楊景髮
조경훈%신홍려%한가저%문흠약%양경발
Monte Carlo simulations are adopted to study the electron motion in the mixture of H2 and CH4 during diamond synthesis via Glow Plasma-assisted Chemical Vapor Deposition (GPCVD). The non-uniform electric field is used and the avalanche of electrons is taken into account in this simulation. The average energy distribution of electrons and the space distribution of effective species such as CH3, CH3+, CH+ and H at various gas pressures are given in this paper,and optimum experimental conditions are inferred from these results,
