现代显示
現代顯示
현대현시
ADVANCED DISPLAY
2011年
9期
22-25
,共4页
王永%孙可%谢莉%孙士祥
王永%孫可%謝莉%孫士祥
왕영%손가%사리%손사상
薄膜晶体管%阵列基板%穿透率%折射率
薄膜晶體管%陣列基闆%穿透率%摺射率
박막정체관%진렬기판%천투솔%절사솔
TFT%array substrate%transmittance%refractive index
提高薄膜晶体管液晶显示器阵列基板的光利用效率的主要方法是提高开口率和穿透率。文章制作了低温多晶硅阵列穿透区多层膜,考察膜层以及结构对穿透率的影响,研究阵列光线穿透率提升的方法。结果表明,层间介质层(ILD)完成后不同折射率膜层接口对穿透率影响较大,平坦层(PL)的厚度对穿透率没有明显影响,导电膜氧化铟锡(ITO)厚度增加,穿透率下降。通过在阵列穿透区减少膜层数量和改变膜层组分,减少折射率差异较大的界面,可增加穿透率7%左右。
提高薄膜晶體管液晶顯示器陣列基闆的光利用效率的主要方法是提高開口率和穿透率。文章製作瞭低溫多晶硅陣列穿透區多層膜,攷察膜層以及結構對穿透率的影響,研究陣列光線穿透率提升的方法。結果錶明,層間介質層(ILD)完成後不同摺射率膜層接口對穿透率影響較大,平坦層(PL)的厚度對穿透率沒有明顯影響,導電膜氧化銦錫(ITO)厚度增加,穿透率下降。通過在陣列穿透區減少膜層數量和改變膜層組分,減少摺射率差異較大的界麵,可增加穿透率7%左右。
제고박막정체관액정현시기진렬기판적광이용효솔적주요방법시제고개구솔화천투솔。문장제작료저온다정규진렬천투구다층막,고찰막층이급결구대천투솔적영향,연구진렬광선천투솔제승적방법。결과표명,층간개질층(ILD)완성후불동절사솔막층접구대천투솔영향교대,평탄층(PL)적후도대천투솔몰유명현영향,도전막양화인석(ITO)후도증가,천투솔하강。통과재진렬천투구감소막층수량화개변막층조분,감소절사솔차이교대적계면,가증가천투솔7%좌우。
Aperture ratio and transmittance increasement were the main methods to improve light efficiency of TFT-LCD array substrate.Multilayer thin films of low temperature poly-Si array transmission area was made,the effect of thin films and structure on transmittance was discussed,how to enhance light transmittance was studied in the paper.The results show that transmittance was greatly affected by different refractive index surface after inter layer dielectrics finished,the effect of planarization layer thickness on transmittance was not obvious,transmittance was decreased with ITO thickness increased.By decreasing the film numbers,changing the film component,the inter surface with great difference of refractive index was reduced and transmittance can be improved by 7% approximately.