CAJ | 학술논문

设计了351 nm紫外光条件下支持亚波长结构干涉光刻的光学透镜组,数值孔径达到0.46,支持双光束最大干涉角度55°,该光学头理论上能光刻的最小结构周期为400 nm.研制了采用熔石英位相光栅作为分束元件的干涉光学头,在351 nm波长下,光刻了周期为450 nm的点阵结构,得到了尺寸约200 nm的凸点结构,实验结果表明,该光学头具有支持亚波长周期结构光刻的功能,是一种亚波长结构器件制造的重要技术手段.
설계료351 nm자외광조건하지지아파장결구간섭광각적광학투경조,수치공경체도0.46,지지쌍광속최대간섭각도55°,해광학두이론상능광각적최소결구주기위400 nm.연제료채용용석영위상광책작위분속원건적간섭광학두,재351 nm파장하,광각료주기위450 nm적점진결구,득도료척촌약200 nm적철점결구,실험결과표명,해광학두구유지지아파장주기결구광각적공능,시일충아파장결구기건제조적중요기술수단.
A lens set has been designed for making sub-wavelength structure with interference lithography at wavelength of 351 nm. The image space numerical aperture is 0.46, the maximum angle between two interference beams is 55 degrees and the minimum pitch is 400 nm theoretically. The performance of the proposed optical head was experimentally verified by using fused silica grating as the beam splitter. Dot matrix with 450 nm period and 200 nm dot is obtained. Experimental results show that the optical head has the ability to fabricate sub-wavelength period structures and can be used as an important tool for fabricating the devices with sub-wavelength structures.