机械工程学报
機械工程學報
궤계공정학보
CHINESE JOURNAL OF MECHANICAL ENGINEERING
2009年
7期
249-253
,共5页
史立秋%孙涛%闫永达%董申
史立鞦%孫濤%閆永達%董申
사립추%손도%염영체%동신
机械-化学方法%芳香烃重氮盐%硅%单层膜
機械-化學方法%芳香烴重氮鹽%硅%單層膜
궤계-화학방법%방향경중담염%규%단층막
Mechanochemical method Aryl diazonium salts Silicon Monolayer
基于金刚石刀具建立能在溶液中加工微小结构的微加工系统,在一端为硝基的四氟化硼芳烃重氮盐溶液(NO<,2>C<,6>H<,4>N<,2>BF<,4>)中用该系统切削硅片,利用机械与化学结合的方法使得芳香烃分子和切削过的硅片之间以共价键连接,实现硅表面的"成形并功能化"的一步完成,为纳米尺度功能化结构的构筑提供一定的试验基础.用扫描电子显微镜(Scanning electronic microscopy,SEM)表征不同切削力下的微结构表面形貌图,为下一步在溶液中"成形并功能化"硅表面提供好的基底.用X射线光电子能谱(X-ray photoelectron spectroscopy,XPS)和原子力显微镜(Atomic force microscopy,AFM)分别研究组装时间和切削速度对切削处生成自组装单层膜(Self-assembly monolayer,SAMs)质量的影响,总结出本试验条件下切削力为20 mN,组装时间为12 h左右,切削速度为500nm/s的时候组装膜表面质量较好.并用AFM对自组装膜的纳米摩擦性能进行检测,证明组装前后硅基底表面的化学组成发生了变化,组装后SAMs表面的摩擦力较大.
基于金剛石刀具建立能在溶液中加工微小結構的微加工繫統,在一耑為硝基的四氟化硼芳烴重氮鹽溶液(NO<,2>C<,6>H<,4>N<,2>BF<,4>)中用該繫統切削硅片,利用機械與化學結閤的方法使得芳香烴分子和切削過的硅片之間以共價鍵連接,實現硅錶麵的"成形併功能化"的一步完成,為納米呎度功能化結構的構築提供一定的試驗基礎.用掃描電子顯微鏡(Scanning electronic microscopy,SEM)錶徵不同切削力下的微結構錶麵形貌圖,為下一步在溶液中"成形併功能化"硅錶麵提供好的基底.用X射線光電子能譜(X-ray photoelectron spectroscopy,XPS)和原子力顯微鏡(Atomic force microscopy,AFM)分彆研究組裝時間和切削速度對切削處生成自組裝單層膜(Self-assembly monolayer,SAMs)質量的影響,總結齣本試驗條件下切削力為20 mN,組裝時間為12 h左右,切削速度為500nm/s的時候組裝膜錶麵質量較好.併用AFM對自組裝膜的納米摩抆性能進行檢測,證明組裝前後硅基底錶麵的化學組成髮生瞭變化,組裝後SAMs錶麵的摩抆力較大.
기우금강석도구건립능재용액중가공미소결구적미가공계통,재일단위초기적사불화붕방경중담염용액(NO<,2>C<,6>H<,4>N<,2>BF<,4>)중용해계통절삭규편,이용궤계여화학결합적방법사득방향경분자화절삭과적규편지간이공개건련접,실현규표면적"성형병공능화"적일보완성,위납미척도공능화결구적구축제공일정적시험기출.용소묘전자현미경(Scanning electronic microscopy,SEM)표정불동절삭력하적미결구표면형모도,위하일보재용액중"성형병공능화"규표면제공호적기저.용X사선광전자능보(X-ray photoelectron spectroscopy,XPS)화원자력현미경(Atomic force microscopy,AFM)분별연구조장시간화절삭속도대절삭처생성자조장단층막(Self-assembly monolayer,SAMs)질량적영향,총결출본시험조건하절삭력위20 mN,조장시간위12 h좌우,절삭속도위500nm/s적시후조장막표면질량교호.병용AFM대자조장막적납미마찰성능진행검측,증명조장전후규기저표면적화학조성발생료변화,조장후SAMs표면적마찰력교대.
A micromachining system based on diamond tool is built, which can process micro structure in solution. The system is used to scribe the silicon surface in aryldiazoninm salt solution (NO<,2>C<,6>H<,4>N<,2>BF<,4>). Arenes can be connected with silicon atom with covalent bonds. Functionalizing and patterning silicon surface are realized simultaneously. This approach will be employed to build nano-scale functional structures. To obtain microstructures with better quality which will act as a good substrate for the following functionalizing and patterning processes, scanning electron microscopy (SEM) is used to characterize the surface morphology with different cutting force. X-ray photoelectron spectroscopy (XPS) as well as atomic force microscopy (AFM) are used to verify the self-assembly monolayers. Effects of the scribed speed and assembly time on the quality of self-assembled monolayer (SAMs) arc discussed, which results in suitable testing parameters (20 mN cutting force, 12 h assembly time and 500 nm/s scribing speed) to produce better films. Atomic force microscopy (AFM) is used to characterize the surface frictional performance. The chemical composition of silicon surface changes after self-assembly, and the friction force of SAMs surface becomes greater.