材料科学技术学报(英文版)
材料科學技術學報(英文版)
재료과학기술학보(영문판)
JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY
2003年
z1期
94-96
,共3页
Plasma ion implantation, an alternative to conventional beam-line ion implantation, is a sheath-acceleration ionbombardment technique and the initial sheath is crucial to the process efficacy and surface properties. The initialspatial potential distributi
