CAJ | 학술논문

多层金属薄膜的机械性质在纳米组件的设计上是非常重要的. 目前,纳米尺度材料的机械性质测量的最主要方法为纳米压痕检测技术. 本文应用分子动力学理论对双层铜金属薄膜界面的结构形态与特性进行分析探讨. 选用FCC结构单晶铜的(100)面,(110)面和双层铜金属薄膜作为探讨界面性质的材料,进而探讨了单晶铜及双层铜金属薄膜的纳米压痕变形性质.
다층금속박막적궤계성질재납미조건적설계상시비상중요적. 목전,납미척도재료적궤계성질측량적최주요방법위납미압흔검측기술. 본문응용분자동역학이론대쌍층동금속박막계면적결구형태여특성진행분석탐토. 선용FCC결구단정동적(100)면,(110)면화쌍층동금속박막작위탐토계면성질적재료,진이탐토료단정동급쌍층동금속박막적납미압흔변형성질.
Understanding the mechanical properties of multilayered metal thin films is very important for their applications in nanoscale devices. Nanoindentation is one of the widely used tools for examining the mechanical properties of metal thin films. In the present study, molecular dynamics simulation was employed to investigate the nanoindentation behavior of a Cu(100)/Cu(110) bilayered thin film. The load-displacement response and the detailed deformation structure of the copper thin film during the nanoindentation were inspected and compared with those of Cu(100) and Cu(110) thin films. It was found that at the indenting stage the maximum indentation load of the bilayered thin film is lower than that of its ingredients, however, they have nearly the same maximum indentation load. At the retracting stage, the maximum attractive force of the bilayered thin film was found near that of its ingredients but occurred much earlier than the ingredients. The detailed deformation structure of the bilayered thin film was observed to be similar to that of the ingredients and correlated very well with the load-displacement response.