核技术
覈技術
핵기술
NUCLEAR TECHNIQUES
2010年
3期
211-214
,共4页
靳硕学%郭立平%彭国良%张蛟龙%杨铮%黎明%刘传胜%巨新%刘实
靳碩學%郭立平%彭國良%張蛟龍%楊錚%黎明%劉傳勝%巨新%劉實
근석학%곽립평%팽국량%장교룡%양쟁%려명%류전성%거신%류실
离子源%辐照损伤%原位透射电镜%氦
離子源%輻照損傷%原位透射電鏡%氦
리자원%복조손상%원위투사전경%양
Ion source%Radiation damage%In situ TEM%Helium
材料中氦和氢积累可引起材料性能的恶化甚至失效.为研究材料内氦和氢的存在形式、氦与氢及缺陷的相互作用、气泡的形成和演变过程以及各种凼素的影响,建立一套离子束能量最高20 keV的潘宁型气体离子源引出和聚焦系统,与200kV透射电镜联机,在离子注入现场原位观察氦和氢不同注入浓度下材料内部的微观结构及变化过程.对离子源进行氦离子的起弧、引出和聚焦测试.离子源在15-60 mA放电电流范围内稳定地工作.在5×10~(-3)Pa和1.5 ×10~(-2)Pa工作气压下,放电电压约380 V和320 V.低气压下引出离子束流比高气压下大,且引出束流随放电电流和吸极电压的增加而增加.等径三圆筒透镜有显著聚焦作用,在距透镜出口150 cm处,离子束流密度提高一个量级以上.能量10 keV左右的氦离子获得束流密度约200 nA·cm~(12)的离子束,可满足多种材料进行在线离子注入和原位电镜观测的需要.
材料中氦和氫積纍可引起材料性能的噁化甚至失效.為研究材料內氦和氫的存在形式、氦與氫及缺陷的相互作用、氣泡的形成和縯變過程以及各種凼素的影響,建立一套離子束能量最高20 keV的潘寧型氣體離子源引齣和聚焦繫統,與200kV透射電鏡聯機,在離子註入現場原位觀察氦和氫不同註入濃度下材料內部的微觀結構及變化過程.對離子源進行氦離子的起弧、引齣和聚焦測試.離子源在15-60 mA放電電流範圍內穩定地工作.在5×10~(-3)Pa和1.5 ×10~(-2)Pa工作氣壓下,放電電壓約380 V和320 V.低氣壓下引齣離子束流比高氣壓下大,且引齣束流隨放電電流和吸極電壓的增加而增加.等徑三圓筒透鏡有顯著聚焦作用,在距透鏡齣口150 cm處,離子束流密度提高一箇量級以上.能量10 keV左右的氦離子穫得束流密度約200 nA·cm~(12)的離子束,可滿足多種材料進行在線離子註入和原位電鏡觀測的需要.
재료중양화경적루가인기재료성능적악화심지실효.위연구재료내양화경적존재형식、양여경급결함적상호작용、기포적형성화연변과정이급각충당소적영향,건립일투리자속능량최고20 keV적반저형기체리자원인출화취초계통,여200kV투사전경련궤,재리자주입현장원위관찰양화경불동주입농도하재료내부적미관결구급변화과정.대리자원진행양리자적기호、인출화취초측시.리자원재15-60 mA방전전류범위내은정지공작.재5×10~(-3)Pa화1.5 ×10~(-2)Pa공작기압하,방전전압약380 V화320 V.저기압하인출리자속류비고기압하대,차인출속류수방전전류화흡겁전압적증가이증가.등경삼원통투경유현저취초작용,재거투경출구150 cm처,리자속류밀도제고일개량급이상.능량10 keV좌우적양리자획득속류밀도약200 nA·cm~(12)적리자속,가만족다충재료진행재선리자주입화원위전경관측적수요.
The accumulation of helium and/or hydrogen in nuclear materials may cause performance deterioration of the materials.In order to provide a unique tool to investigate the He-and/or H-caused problems,such as interaction of helium with hydrogen and defects,formation of gas bubbles and its evolution,and the related effects,we designed a low energy(≤20 keV)cold cathode Penning ion source,which will be interfaced to a 200 kV transmission electron microscope (TEM),for monitoring continuously the evolution of micro-structure during the He~+ or H~+ ion implantation.Studies on discharge voltage-current characteristics of the ion source,and extraction and focusing ofthe ion beam were performed.The ion source works stably with 15-60 mA of the discharge current.Under the gas pressure of 5×10~(-3) Pa and 1.5×10~(-2) Pa,the discharge voltage are about 380 V and 320 V, respectively.The extracted ion current under lower gas pressure is greater than that under higher gas pressure,and it increases with the discharge current and extraction voltage.The ion lens consisting of three equal-diameter metal cylinder focus the ion beam effectively,so that the beam density at the 150 cm away from the lens exit increases by a over one order of magnitude.implantation and in situ TEM observation for many kinds of nuclear materials.