CAJ | 학술논문

对六价镀铬的工艺进行研究,在45℃、电流密度为15 A·dm-2时电沉积出光亮平整、无缺陷的铬膜.在此基础上在纯铁基体上电沉积制备出一系列不同厚度的铬薄膜,并对其残余应力进行测量和研究.结果表明:Cr膜的平均残余应力和分布残余应力均为拉应力,由于Cr膜在较薄时残余应力的骤降,可判断出其残余应力主要来自于Cr膜的界面应力,与基于Thomas-Fermi-Dirac-Cheng(TFDC)电子理论的判断结果相一致.
대륙개도락적공예진행연구,재45℃、전류밀도위15 A·dm-2시전침적출광량평정、무결함적락막.재차기출상재순철기체상전침적제비출일계렬불동후도적락박막,병대기잔여응력진행측량화연구.결과표명:Cr막적평균잔여응력화분포잔여응력균위랍응력,유우Cr막재교박시잔여응력적취강,가판단출기잔여응력주요래자우Cr막적계면응력,여기우Thomas-Fermi-Dirac-Cheng(TFDC)전자이론적판단결과상일치.
The technology of hexavalent Cr electroplating was studided.It is founed that the chromium films electrodeposited at 45 ℃ and the current density of 15 A·dm-2 are bright and smooth and have no defects．According to the technology,a series of chromium films with different thickness were deposited on the pure ferrous substrates.The residual stresses in the chromium films were measured and analyzed.The results show that both average residual stress and distributional residual stress in the films are tensile stress.Because of the residual stress in the thinner film abruptly dropping,the residual stress comes mainly from the interface stress of the chromium film.This conclusion is consistent with the judgment of the TFDC(Thomas-Fermi-Dirac-Cheng's electron theory).