半导体学报
半導體學報
반도체학보
CHINESE JOURNAL OF SEMICONDUCTORS
2006年
9期
1572-1577
,共6页
方杰%刘泽文%赵嘉昊%陈忠民%韦嘉%刘理天%李志坚
方傑%劉澤文%趙嘉昊%陳忠民%韋嘉%劉理天%李誌堅
방걸%류택문%조가호%진충민%위가%류리천%리지견
LC低通滤波器%低损耗衬底%片上电感%RF
LC低通濾波器%低損耗襯底%片上電感%RF
LC저통려파기%저손모츤저%편상전감%RF
LC low-pass filter%low-loss substrate%on-chip inductor%RF
分析比较了不同种类衬底上无源器件(片上电感和电容)的损耗机理,在OPS(氧化多孔硅)和HR(高阻硅)低损耗衬底上分别实现了片上低通滤波器.为了研究衬底损耗,设计了平面螺旋电感,其Q值在两种衬底上的仿真结果都超过了20.在OPS衬底上的低通滤波器实测-3dB带宽为2.9GHz,通带插入损耗在500MHz为0.87dB;在HR衬底上的低通滤波器实测-3dB带宽为2.3GHz,通带插入损耗在500MHz为0.42dB.
分析比較瞭不同種類襯底上無源器件(片上電感和電容)的損耗機理,在OPS(氧化多孔硅)和HR(高阻硅)低損耗襯底上分彆實現瞭片上低通濾波器.為瞭研究襯底損耗,設計瞭平麵螺鏇電感,其Q值在兩種襯底上的倣真結果都超過瞭20.在OPS襯底上的低通濾波器實測-3dB帶寬為2.9GHz,通帶插入損耗在500MHz為0.87dB;在HR襯底上的低通濾波器實測-3dB帶寬為2.3GHz,通帶插入損耗在500MHz為0.42dB.
분석비교료불동충류츤저상무원기건(편상전감화전용)적손모궤리,재OPS(양화다공규)화HR(고조규)저손모츤저상분별실현료편상저통려파기.위료연구츤저손모,설계료평면라선전감,기Q치재량충츤저상적방진결과도초과료20.재OPS츤저상적저통려파기실측-3dB대관위2.9GHz,통대삽입손모재500MHz위0.87dB;재HR츤저상적저통려파기실측-3dB대관위2.3GHz,통대삽입손모재500MHz위0.42dB.
The loss mechanisms of different passive devices (on-chip inductors and capacitors) on different substrates are analyzed and compared. OPS (oxidized porous silicon) and HR (high-resistivity) substrates are used as low-loss substrates for on-chip planar LPF (low pass filter) fabrication. For the study of substrate loss, a planar coil inductor is also designed. Simulation results show that Q (the quality factor) of the inductor on both substrates is over 20. Measurements of the LPF on OPS substrate give a - 3dB bandwidth of 2.9GHz and a midband insertion loss of 0. 87dB at 500MHz. The LPF on HR substrate gives a - 3dB bandwidth of 2.3GHz and a midband insertion loss of 0.42dB at 500MHz.