光子学报
光子學報
광자학보
ACTA PHOTONICA SINICA
2002年
11期
1377-1381
,共5页
文泓桥%吴良%宋军%盛钟延%何赛灵
文泓橋%吳良%宋軍%盛鐘延%何賽靈
문홍교%오량%송군%성종연%하새령
时域有限差分法(FDTD)%蚀刻衍射光栅(EDG)%全内反射(TIR)%后向衍射%理想匹配层(PML)%波分复用(WDM)
時域有限差分法(FDTD)%蝕刻衍射光柵(EDG)%全內反射(TIR)%後嚮衍射%理想匹配層(PML)%波分複用(WDM)
시역유한차분법(FDTD)%식각연사광책(EDG)%전내반사(TIR)%후향연사%이상필배층(PML)%파분복용(WDM)
Finite-difference time-domain(FDTD) method%Etched diffraction grating(EDG)%Total internal reflect(TIR)%Retro-diffraction%Perfectly matched layer (PML)%Wavelength-division multiplexing(WDM)
采用时域有限差分法(FDTD)结合理想匹配层(PML)边界条件及周期性边界条件对两种结构槽面的后向衍射效率进行了分析,在P偏振和S偏振两种情况下,均得到了比传统差分方法和射线近似方法更精确的解.数值计算结果表明:全内反射(TIR)结构在高折射率材料(如InP)的蚀刻衍射光栅(EDG)中很有效,而在低折射率材料(如SiO2)的EDG中效果不理想.
採用時域有限差分法(FDTD)結閤理想匹配層(PML)邊界條件及週期性邊界條件對兩種結構槽麵的後嚮衍射效率進行瞭分析,在P偏振和S偏振兩種情況下,均得到瞭比傳統差分方法和射線近似方法更精確的解.數值計算結果錶明:全內反射(TIR)結構在高摺射率材料(如InP)的蝕刻衍射光柵(EDG)中很有效,而在低摺射率材料(如SiO2)的EDG中效果不理想.
채용시역유한차분법(FDTD)결합이상필배층(PML)변계조건급주기성변계조건대량충결구조면적후향연사효솔진행료분석,재P편진화S편진량충정황하,균득도료비전통차분방법화사선근사방법경정학적해.수치계산결과표명:전내반사(TIR)결구재고절사솔재료(여InP)적식각연사광책(EDG)중흔유효,이재저절사솔재료(여SiO2)적EDG중효과불이상.
The analysis of retro-diffraction in Etched Diffraction Grating (EDG) is given in the present paper by using a Finite-Difference Time-Domain (FDTD) method combined with perfectly matched layers (PML) and a periodic boundary condition.This numerical method is more accurate and reliable than other methods such as the ray approximation method or the differential method.Numerical simulation is given for both P-polarized and S-polarized lights.It is shown that the total internal reflection (TIR) structure is effective for high refractive index(e.g.InP) based gratings,but it doesn′t perform well for low refractive index(e.g.silica) based gratings.