团簇沉积C-N薄膜的研究
단족침적C-N박막적연구
Investigation of C-N film by cluster beam deposition
  • 万方数据
    核技术 핵기술
    NUCLEAR TECHNIQUES
    2001年 6期 433-438 ,共6页

    陈景升%俞国庆%张志滨%潘浩昌%朱德彰%徐洪杰%郑志豪%阎逢元

    진경승%유국경%장지빈%반호창%주덕창%서홍걸%정지호%염봉원

    团簇沉积%碳氮薄膜%结构 糰簇沉積%碳氮薄膜%結構
    단족침적%탄담박막%결구
    利用荷能团簇沉积装置在高阻硅(111)衬底上沉积了碳氮薄膜。通过红外光谱、拉曼谱和X光电子能谱对薄膜的结构和化学组分进行了分析。结果表明，薄膜中存在N-sp3C(β-C3N4的键合方式)，但以N-sp2C和C=C双键的结合方式为主。
    이용하능단족침적장치재고조규(111)츤저상침적료탄담박막。통과홍외광보、랍만보화X광전자능보대박막적결구화화학조분진행료분석。결과표명，박막중존재N-sp3C(β-C3N4적건합방식)，단이N-sp2C화C=C쌍건적결합방식위주。
    C-N films were synthesized on high-resistance Si(111) substrates by cluster beam deposition method.Transmission infrared spectroscopy,Raman spectroscopy and X-ray photoelectron spectroscopy were used to characterize the structure of the films.IR,Raman and XPS results indicated that there existed some amount of N-sp3C bonds,but N-sp2C and CC bonds were predominant in the films.
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