光学学报
光學學報
광학학보
ACTA OPTICA SINICA
2003年
z1期
76-77
,共2页
Radial distribution of OH diffusion in silica glass preform during jacketing process using a oxy-hydrogen burner was investigated by FTIR spectroscopy. The OH peaks at the jacketing boundary and the surface of the preform were found to be due to diffusion of OH incorporated from the burner.