物理化学学报
物理化學學報
물이화학학보
ACTA PHYSICO-CHIMICA SINICA
2010年
2期
345-349
,共5页
射频等离子体%一氧化碳加氢%铜钴基催化剂%低碳醇
射頻等離子體%一氧化碳加氫%銅鈷基催化劑%低碳醇
사빈등리자체%일양화탄가경%동고기최화제%저탄순
Glow discharge plasma%CO hydrogenation%Copper-cobalt based catalyst%Higher alcohol
采用射频等离子体技术制备新型Cu-Co/SiO_2催化剂.与直接焙烧制备的样品相比,射频等离子体处理提高了催化剂的比表面积,显著增大了活性物种Co的表面含量,有效改进了催化剂的还原性能.以CO加氢合成低碳混合醇为模型反应,在563 K, 5.0 MPa,6000 h~(-1),V(H_2):V(CO)=1.6的条件下,等离子体处理和等离子体处理后再焙烧样品比673 K焙烧样品的催化活性提高30.46%和65.30%,低碳醇的时空收率分别提高58.22%和76.11%.
採用射頻等離子體技術製備新型Cu-Co/SiO_2催化劑.與直接焙燒製備的樣品相比,射頻等離子體處理提高瞭催化劑的比錶麵積,顯著增大瞭活性物種Co的錶麵含量,有效改進瞭催化劑的還原性能.以CO加氫閤成低碳混閤醇為模型反應,在563 K, 5.0 MPa,6000 h~(-1),V(H_2):V(CO)=1.6的條件下,等離子體處理和等離子體處理後再焙燒樣品比673 K焙燒樣品的催化活性提高30.46%和65.30%,低碳醇的時空收率分彆提高58.22%和76.11%.
채용사빈등리자체기술제비신형Cu-Co/SiO_2최화제.여직접배소제비적양품상비,사빈등리자체처리제고료최화제적비표면적,현저증대료활성물충Co적표면함량,유효개진료최화제적환원성능.이CO가경합성저탄혼합순위모형반응,재563 K, 5.0 MPa,6000 h~(-1),V(H_2):V(CO)=1.6적조건하,등리자체처리화등리자체처리후재배소양품비673 K배소양품적최화활성제고30.46%화65.30%,저탄순적시공수솔분별제고58.22%화76.11%.
Novel Cu-Co/SiO_2 catalysts were prepared by conventional impregnation methods with the assistance of glow discharge plasma technology. Compared with a conventional calcined sample, the plasma remarkably improved the specific surface area of the catalyst and increased the concentration of active cobalt species on the catalyst's surface. The reducibility of the cobalt was effectively improved as well. Catalytic test results showed that comparison to the conventional 673 K calcined sample, the CO hydrogenation activity of the two plasma enhanced samples (one treated only by plasma and the other assisted by plasma followed by calcination) increased by 30.46% and 65.30%, respectively. Their time space yields of higher alcohols also increased by 58.22% and 76.11%, respectively, under 5.0 MPa, 6000 h~(-1), 563 K and a H_2/CO volume ratio of 1.6.