CAJ | 학술논문

用磁控溅射法制备Ni_(80)Fe_(20)薄膜,用中温管式炉对NiFe薄膜进行500℃退火处理,用X射线衍射(XRD)仪对退火后的薄膜进行结构分析.运用飞秒激光泵浦-探测技术研究了衬底和退火处理对NiFe薄膜瞬时反射率的影响.实验结果表明:硅片和K9玻璃衬底对20nm厚NiFe薄膜的瞬时反射率曲线影响较小,对40nm和60nm厚NiFe薄膜的瞬时反射率曲线影响较大;经退火处理后的NiFe薄膜的瞬时反射率曲线由小于5ps的时间尺度和大于5ps的时间尺度两部分组成.
용자공천사법제비Ni_(80)Fe_(20)박막,용중온관식로대NiFe박막진행500℃퇴화처리,용X사선연사(XRD)의대퇴화후적박막진행결구분석.운용비초격광빙포-탐측기술연구료츤저화퇴화처리대NiFe박막순시반사솔적영향.실험결과표명:규편화K9파리츤저대20nm후NiFe박막적순시반사솔곡선영향교소,대40nm화60nm후NiFe박막적순시반사솔곡선영향교대;경퇴화처리후적NiFe박막적순시반사솔곡선유소우5ps적시간척도화대우5ps적시간척도량부분조성.
NiFe films were deposited on Si and K9 glass substrates by magnetron sputtering technique. A part of NiFe films were annealed at 500℃ by CVD reactor. The structural was analyzed by X-ray diffraction (XRD) diffractometer. The influences of substrates and annealing on the transient reflectivity of NiFe films were studied using femtosecond laser pump-probe technology. The results show that the influence of Si and K9 glass substrates on the transient reflectivity curve of 20nm-thick NiFe film is smaller, and the influence of Si and K9 glass substrates on the transient reflectivity curve of 40nm-thick and 60nm-thick NiFe film is greater. The transient reflectivity curves of the annealed NiFe films consist of two parts, one is the timescale <5ps and the other is the timescale >5ps.