真空科学与技术学报
真空科學與技術學報
진공과학여기술학보
JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY
2009年
6期
707-711
,共5页
无机非金属材料%多弧离子镀%TiN基硬质膜%高速钢%偏压
無機非金屬材料%多弧離子鍍%TiN基硬質膜%高速鋼%偏壓
무궤비금속재료%다호리자도%TiN기경질막%고속강%편압
Inorganic non-metallic materials%Multi-arc ion plating%TiN base hard film%High speed steel%Bias voltage
采用多弧离子镀技术,使用Ti Al Zr合金靶和Cr靶,在W18Cr4V高速钢基体上沉积(Ti,Al,Zr,Cr)N多组元氮化物膜.利用扫描电镜(SEM)、电子能谱仪(EDS)和X射线衍射(XRD)对薄膜的成分、结构和微观组织进行测量和表征;利用划痕仪、显微硬度计测评薄膜的力学性能.结果表明,获得的多组元氮化物膜仍具有B1 NaCl型的TiN面心立方结构;薄膜的成分除-50V偏压外,其它偏压下的变化均不明显;增大偏压可减少薄膜表面的液滴污染,提高薄膜的显微硬度及膜/基结合力,最高值可分别达到HV3300和190N.
採用多弧離子鍍技術,使用Ti Al Zr閤金靶和Cr靶,在W18Cr4V高速鋼基體上沉積(Ti,Al,Zr,Cr)N多組元氮化物膜.利用掃描電鏡(SEM)、電子能譜儀(EDS)和X射線衍射(XRD)對薄膜的成分、結構和微觀組織進行測量和錶徵;利用劃痕儀、顯微硬度計測評薄膜的力學性能.結果錶明,穫得的多組元氮化物膜仍具有B1 NaCl型的TiN麵心立方結構;薄膜的成分除-50V偏壓外,其它偏壓下的變化均不明顯;增大偏壓可減少薄膜錶麵的液滴汙染,提高薄膜的顯微硬度及膜/基結閤力,最高值可分彆達到HV3300和190N.
채용다호리자도기술,사용Ti Al Zr합금파화Cr파,재W18Cr4V고속강기체상침적(Ti,Al,Zr,Cr)N다조원담화물막.이용소묘전경(SEM)、전자능보의(EDS)화X사선연사(XRD)대박막적성분、결구화미관조직진행측량화표정;이용화흔의、현미경도계측평박막적역학성능.결과표명,획득적다조원담화물막잉구유B1 NaCl형적TiN면심립방결구;박막적성분제-50V편압외,기타편압하적변화균불명현;증대편압가감소박막표면적액적오염,제고박막적현미경도급막/기결합력,최고치가분별체도HV3300화190N.
The multi-component (Ti,Al,Zr,Cr) N coatings were deposited by multi-arc ion plating on high speed steel substrates(W18Cr4V).The microstructures and mechanical properties of the coatings were characterized with X-ray diffraction (XRD),X-ray energy dispersion spectroscopy (EDS),scanning electron microscopy (SEM) and conventional surface probes.The impacts of the coating growth conditions on its microstructures and properties were studied.The results show that the TiN(Bl-NaCl) face-centered cubic phase exists in the multi-component (Ti,Al,Zr,Cr) N coatings,and that the bias voltage,except -50V,little affects its stoichiometries.Interesting finding is that an increase of the bias reduces the surface wettability of some liquids,and enhances its micro-hardness and adhesion at the film/substrate interface up to 3300HV and 190N,respectively.