CAJ | 학술논문

建立了面向复杂光学表面的大气等离子抛光系统,并用该系统进行硅片表面加工的实验研究.研究了CF_4、SF_6两种气体的放电特性以及加工效果,得到了加工速率与功率,流量间的关系,并通过原子力显微镜观察了加工后的表面质量.
건립료면향복잡광학표면적대기등리자포광계통,병용해계통진행규편표면가공적실험연구.연구료CF_4、SF_6량충기체적방전특성이급가공효과,득도료가공속솔여공솔,류량간적관계,병통과원자력현미경관찰료가공후적표면질량.
The atmospheric pressure polishing system of complex optical surface was established.The experimental study on machining of silicon wafer surface was made by using this system.The discharge characteristics and machining effect of CF4 and SF6 were researched.The relationship between machining rate and power & flow was gotten by experiment.The quality of machined surface was observed by atomic force microscope(AFM).