CAJ | 학술논문

以深刻蚀和热氧化工艺为基础,提出了一种新的阵列波导光栅(AWG)制备技术.这一工艺可使AWG中的波导侧向留有一硅层.采用有限元法和有限差分束传播法分别计算了存在这一硅层时的波导应力分布和有效折射率.结果表明由于这一侧向硅层的存在,使AWG中波导在水平和垂直方向的应力趋于一致,AWG的偏振相关波长明显减小.
이심각식화열양화공예위기출,제출료일충신적진렬파도광책(AWG)제비기술.저일공예가사AWG중적파도측향류유일규층.채용유한원법화유한차분속전파법분별계산료존재저일규층시적파도응력분포화유효절사솔.결과표명유우저일측향규층적존재,사AWG중파도재수평화수직방향적응력추우일치,AWG적편진상관파장명현감소.
A new technology for fabrication of silica on silicon arrayed waveguide grating (AWG) based on deep etching and thermal oxidation is presented.Using this method,a silicon layer is remained at the side of waveguide.The stress distribution and effective refractive index of waveguide fabricated by this approach are calculated using finite element and finite difference beam propagation method,respectively.The results of these studies indicate that the stress of silica on silicon optical waveguide can be matched in parallel and vertical direction and AWG polarization dependent wavelength (PDλ) can be reduced effectively due to side-silicon layer.