功能材料与器件学报
功能材料與器件學報
공능재료여기건학보
JOURNAL OF FUNCTIONAL MATERIALS AND DEVICES
2001年
3期
284-286
,共3页
CVD%金刚石薄膜%原位测量%反射率
CVD%金剛石薄膜%原位測量%反射率
CVD%금강석박막%원위측량%반사솔
报道了化学气相沉积金刚石薄膜生长的原位反射率测量,提出了监控金刚石薄膜生长的激
光反射多光束干涉的数学模型。通过原位反射率的测量,精确监控了金刚石薄膜的生长厚度,
成功地制备了红外增透膜。这种方法的测量装置简单、紧凑而且可靠。
報道瞭化學氣相沉積金剛石薄膜生長的原位反射率測量,提齣瞭鑑控金剛石薄膜生長的激
光反射多光束榦涉的數學模型。通過原位反射率的測量,精確鑑控瞭金剛石薄膜的生長厚度,
成功地製備瞭紅外增透膜。這種方法的測量裝置簡單、緊湊而且可靠。
보도료화학기상침적금강석박막생장적원위반사솔측량,제출료감공금강석박막생장적격
광반사다광속간섭적수학모형。통과원위반사솔적측량,정학감공료금강석박막적생장후도,
성공지제비료홍외증투막。저충방법적측량장치간단、긴주이차가고。
In this paper the in situ reflectivity of CVD (chemical vapor deposition) diamond thin film
was measured. By in situ monitoring the reflectivity from the growing CVD diamond thin film surface,
the thickness of the diamond film can be accurately measured and controlled. A mathematical model
is presented. Using this method, diamond IR antireflective thin film were successfully deposited
on a silicon substrate. The measure equipment is quite simple, compact and reliable.