CAJ | 학술논문

为提高石英玻璃表面金属化膜层与基底的结合强度,利用金属蒸发真空弧(MEVVA)离子源引出的Ti离子对石英玻璃及镀Ti膜石英玻璃进行离子注入,剂量选择3×10~(16),5×10~(16) ion/cm~2,模拟分析了注入离子能量的分布,采用卢瑟福背散射分析了注入Ti离子在基体中的深度分布,利用划痕实验机对比了镀Ti膜石英玻璃经Ti离子注入前后的膜基结合强度.实验结果表明:石英玻璃经Ti离子(5×10~(16) ion/cm~2)注入后,钛在基体中呈高斯分布,最大浓度分布在15～35 nm范围内;镀Ti膜石英玻璃经Ti离子(5×10~(16) ion/cm~2)注入后,最大浓度分布在5～15 nm范围内,注入离子穿透薄膜进入基材内部.Ti离子注入剂量为5×10~(16) ion/cm~2时,膜基的结合强度比未注入样品提高了90%.
위제고석영파리표면금속화막층여기저적결합강도,이용금속증발진공호(MEVVA)리자원인출적Ti리자대석영파리급도Ti막석영파리진행리자주입,제량선택3×10~(16),5×10~(16) ion/cm~2,모의분석료주입리자능량적분포,채용로슬복배산사분석료주입Ti리자재기체중적심도분포,이용화흔실험궤대비료도Ti막석영파리경Ti리자주입전후적막기결합강도.실험결과표명:석영파리경Ti리자(5×10~(16) ion/cm~2)주입후,태재기체중정고사분포,최대농도분포재15～35 nm범위내;도Ti막석영파리경Ti리자(5×10~(16) ion/cm~2)주입후,최대농도분포재5～15 nm범위내,주입리자천투박막진입기재내부.Ti리자주입제량위5×10~(16) ion/cm~2시,막기적결합강도비미주입양품제고료90%.
Titanium ions were implanted into quartz and quartz coated with Ti film by MEVVA(Metal Vapor Vacuum Arc)ion source implanter.The dose was 3×10~(16) ions/cm2 and 5×10~(16) ions/cm2.The ion energy and depth distribution were analyzed using simulation method. Depth profiles of Ti concentration were measured by RutIlerf-0rd Backscattering Spectrometry(RBS).The interfacial adhesion and bond strength between thin film coating and substrate were tested by scratch method. The result shows that implanted with Ti the largest component of Ti is about 30 nm for quartz and 15nm for quartz coated with Ti film.Implantation ions penetrated into the substrate through the film. The interfacial adhesion and bond strength between thin film coating and substrate have an increase of 90% after Ti ions implantation with the dose of 5×10~(16) ions/cm~2.