CAJ | 학술논문

利用电子回旋共振(ECR)氢等离子体处理n型4H-SiC(0.5～1.5×10~(19)cm~(-3))表面,采用溅射法制备碳化钛(TiC)电极,并在低温(<800℃)条件下退火.直线传输线模型(TLM)测试结果表明,TiC电极无需退火即可与SiC形成欧姆接触,采用ECR氢等离子体处理能明显降低比接触电阻,并在600℃退火时获得了最小的比接触电阻2.45×10~(-6)Ω·cm~2;当退火温度超过600℃时,欧姆接触性能开始退化,但是比接触电阻仍然低于未经氢等离子体处理的样品,说明ECR氢等离子体处理对防止高温欧姆接触性能劣化仍有明显的效果.利用X射线衍射(XRD)分析了不同退火温度下TiC/SiC界面的物相组成,揭示了电学特性与微观结构的关系.
이용전자회선공진(ECR)경등리자체처리n형4H-SiC(0.5～1.5×10~(19)cm~(-3))표면,채용천사법제비탄화태(TiC)전겁,병재저온(<800℃)조건하퇴화.직선전수선모형(TLM)측시결과표명,TiC전겁무수퇴화즉가여SiC형성구모접촉,채용ECR경등리자체처리능명현강저비접촉전조,병재600℃퇴화시획득료최소적비접촉전조2.45×10~(-6)Ω·cm~2;당퇴화온도초과600℃시,구모접촉성능개시퇴화,단시비접촉전조잉연저우미경경등리자체처리적양품,설명ECR경등리자체처리대방지고온구모접촉성능열화잉유명현적효과.이용X사선연사(XRD)분석료불동퇴화온도하TiC/SiC계면적물상조성,게시료전학특성여미관결구적관계.
The surface of highly doped n-type(0.5～1.5×10~(19)cm~(-3)) 4H-SiC was treated by electronic cyclotron resonance(ECR) hydrogen plasma. TiC electrodes were fabricated by sputtering and low temperature(<800℃) annealing process. The results of TLM measurement indicated that TiC electrodes showed ohmic behavior without annealing and the treatment of ECR hydrogen plasma decreased the annealing temperature effectively. The lowest contact resistivity 2.45×10~(-6)Ω·cm~2 was obtained after annealing at 600℃. After annealing above 600℃ the property of ohmic contact started to degenerate, but the specific contact resistivity was still much lower than that of samples which weren't treated by hydrogen plasma. This phenomenon showed that ECR hydrogen plasma treatment had a significant effect on avoiding deterioration of ohmic contact under high temperature. To reveal the correlation between electrical properties and microstructures, XRD was used to determine the intermetallic compound formed at the TiC/4H-SiC interface at different annealing temperatures.