掩模版制作工艺中典型问题探析
엄모판제작공예중전형문제탐석
Key Factors Analysis of Photomask Process
  • 万方数据
    固体电子学研究与进展 고체전자학연구여진전
    RESEARCH & PROGRESS OF SOLID STATE ELECTRONICS
    2009年 4期 606-607,614 ,共3页

    叶红%吴会龙

    협홍%오회룡

    光刻掩模版%工艺流程%检测分析 光刻掩模版%工藝流程%檢測分析
    광각엄모판%공예류정%검측분석
    photomask%process%detection and analysisEEACC%2500
    针对制版工艺中典型质量问题事例,分析了影响光刻掩模版的质量因素,提出了有效的解决方案,对保证掩模版质量、提高掩模版的制作水平具有指导意义.
    침대제판공예중전형질량문제사례,분석료영향광각엄모판적질량인소,제출료유효적해결방안,대보증엄모판질량、제고엄모판적제작수평구유지도의의.
    The key factors, which influence the quality of photomask, are discussed. Some examples on quality problem in the photomask process are presented.The method to solve this problem is given. The results show that improving photomask fabrication is very important and essential for the photomask quality.
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