催化剂水对掺杂氟的氧化锡膜性能与结构的影响
최화제수대참잡불적양화석막성능여결구적영향
Influences of H2O on the Structure and Properties of Sn:F Film
  • 万方数据
    稀有金属材料与工程 희유금속재료여공정
    RARE METAL MATERIALS AND ENGINEERNG
    2008年 6期 952-955 ,共4页

    赵洪力%刘起英%杨静凯%刘艳丽%张福成

    조홍력%류기영%양정개%류염려%장복성

    低辐射玻璃%在线镀膜%SnO2膜%H2O 低輻射玻璃%在線鍍膜%SnO2膜%H2O
    저복사파리%재선도막%SnO2막%H2O
    low-E glass%on-line CVD%precursor%F-doped%activator
    采用常压化学气相沉积法(APCVD),以有机金属化合物-单丁三氯化锡(C4H9SnCl3,MBTC)和三氟乙烯(CF3COOH,TFA)为前驱物和掺杂剂,以水为催化剂,在线制备了F掺杂的SnO2膜;采用XRD、SEM、椭偏仪等方法研究催化剂H2O的用量对薄膜的结构和光电性能的影响.结果表明,H2O可促进反应混合气体在基板表面的热分解反应,加速薄膜沉积速率,提高薄膜结晶性能.
    채용상압화학기상침적법(APCVD),이유궤금속화합물-단정삼록화석(C4H9SnCl3,MBTC)화삼불을희(CF3COOH,TFA)위전구물화참잡제,이수위최화제,재선제비료F참잡적SnO2막;채용XRD、SEM、타편의등방법연구최화제H2O적용량대박막적결구화광전성능적영향.결과표명,H2O가촉진반응혼합기체재기판표면적열분해반응,가속박막침적속솔,제고박막결정성능.
    F-doped tin oxide (Sn:F) film was prepared by atmosphere pressure chemical vapor deposition (APCVD) on float glass using monobutyltin trichloride (C4H9SnCl3, MBTC) and trifluoro acetic acid (CF3COOH, TFA) as the precursor and dopant, respectively. Different concentrations of H2O were used as the activator. The prepared films were characterized by means of XRD, SEM, and UV-VIS-NIR spectroscopy. Experimental results reveal that the structures and properties of the films are greatly affected by the H2O content. Water in a certain range of concentrations will promote the formation of SN: F film and improve the properties of the films.
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