人工晶体学报
人工晶體學報
인공정체학보
2000年
3期
240-244
,共5页
魏爱香%陈弟虎%张海燕%唐新桂%周友国%杨增红
魏愛香%陳弟虎%張海燕%唐新桂%週友國%楊增紅
위애향%진제호%장해연%당신계%주우국%양증홍
四配位非晶碳薄膜%掺杂%拉曼光谱%表面形貌
四配位非晶碳薄膜%摻雜%拉曼光譜%錶麵形貌
사배위비정탄박막%참잡%랍만광보%표면형모
tetrahedral amorphous carbon film%doping%Raman spectroscopy%surface morphology
采用磁过滤真空溅射离子沉积技术,用氩气和氮气共溅射石墨靶,在不同氮气分压下,制备了一组不同氮含量的四配位非晶碳薄膜(ta-C:N).用X射线光电子能谱确定ta-C:N薄膜中的氮含量;研究了氮含量对ta-C薄膜的拉曼光谱和表面形貌的影响.结果表明:不含氮的ta-C薄膜的拉曼光谱是中心在1580cm-1、范围从1200cm-1至2000cm-1的类高斯峰,表面均匀光滑;含氮的ta-C:N薄膜,其拉曼光谱分裂为1360 cm-1的D带和1580 cm-1的G带,且D带与G带的最大强度比, 以及薄膜的表面粗糙度随氮含量的增加而增大.最后讨论了氮含量对ta-C薄膜的微结构的影响.
採用磁過濾真空濺射離子沉積技術,用氬氣和氮氣共濺射石墨靶,在不同氮氣分壓下,製備瞭一組不同氮含量的四配位非晶碳薄膜(ta-C:N).用X射線光電子能譜確定ta-C:N薄膜中的氮含量;研究瞭氮含量對ta-C薄膜的拉曼光譜和錶麵形貌的影響.結果錶明:不含氮的ta-C薄膜的拉曼光譜是中心在1580cm-1、範圍從1200cm-1至2000cm-1的類高斯峰,錶麵均勻光滑;含氮的ta-C:N薄膜,其拉曼光譜分裂為1360 cm-1的D帶和1580 cm-1的G帶,且D帶與G帶的最大彊度比, 以及薄膜的錶麵粗糙度隨氮含量的增加而增大.最後討論瞭氮含量對ta-C薄膜的微結構的影響.
채용자과려진공천사리자침적기술,용아기화담기공천사석묵파,재불동담기분압하,제비료일조불동담함량적사배위비정탄박막(ta-C:N).용X사선광전자능보학정ta-C:N박막중적담함량;연구료담함량대ta-C박막적랍만광보화표면형모적영향.결과표명:불함담적ta-C박막적랍만광보시중심재1580cm-1、범위종1200cm-1지2000cm-1적류고사봉,표면균균광활;함담적ta-C:N박막,기랍만광보분렬위1360 cm-1적D대화1580 cm-1적G대,차D대여G대적최대강도비, 이급박막적표면조조도수담함량적증가이증대.최후토론료담함량대ta-C박막적미결구적영향.
Nitrogen-containing tetrahedral amorphous carbon films (ta-C) have been prepared by magnetic field filtered plasma stream deposition method. The plasma stream was first formed by sputtering of a graphite target in nitrogen-argon atmosphere. The microstructure and surface morphology of the films having different nitrogen-doping levels have been studied using X-ray photoelectron spectroscopy (XPS), Raman spectroscopy and atomic force microscopy. The results showed that the nitrogen-free ta-C films have a single and nearly symmetric very broad Raman peak range from 1200 cm-1 to 2000 cm-1 with the centerline at about 1580 cm-1. The surface morphology of the films is very smooth and uniform. The Raman spectra of nitrogen-containing ta-C films exhibit two broad peaks centered approximately at 1360 cm-1 (D peak) and 1580 cm-1 (G peak). The ratio of the maximum intensity of D band and G band increases with the amount of nitrogen incorporated into ta-C films. The correlation between microstructure and nitrogen content in these films was discussed.