CAJ | 학술논문

在水体系中利用直流电沉积的方法以IrC13为主盐在铂基体上制备出了Ir层.利用SEM、EDS和XPS对不同工艺参数下所制备Ir层的表面形貌及成分进行了分析,并最终获得了最优的电沉积工艺条件.结果表明:IrCl3主盐浓度对Ir层形貌有较大影响,浓度太低时电沉积的铱层太薄,导致铱层易起皮或产生裂纹,故适当提高主盐的浓度有利于改善Ir层质量:在一定的pH值范围内,电沉积所制备的lr层表面形貌差别不大,表面均比较平整,Ir颗粒比较均匀、致密;电流密度对Ir层表面形貌尤其是对Ir层结晶颗粒的大小和致密性影响较大;电沉积溶液的温度太低时,不能沉积出Ir层,温度太高时,则沉积出的Ir层粗糙、表面形貌不均匀.
재수체계중이용직류전침적적방법이IrC13위주염재박기체상제비출료Ir층.이용SEM、EDS화XPS대불동공예삼수하소제비Ir층적표면형모급성분진행료분석,병최종획득료최우적전침적공예조건.결과표명:IrCl3주염농도대Ir층형모유교대영향,농도태저시전침적적의층태박,도치의층역기피혹산생렬문,고괄당제고주염적농도유리우개선Ir층질량:재일정적pH치범위내,전침적소제비적lr층표면형모차별불대,표면균비교평정,Ir과립비교균균、치밀;전류밀도대Ir층표면형모우기시대Ir층결정과립적대소화치밀성영향교대;전침적용액적온도태저시,불능침적출Ir층,온도태고시,칙침적출적Ir층조조、표면형모불균균.
Iridium layer was prepared on platinum substrate under constant current in aqueous system using anhydrous iridium chloride as precursors.The surface morphology and the composition of the iridium layer were characterized by SEM,EDS and XPS.The optimized condition was derived.The results show that the concentration of iridium chloride has great influence on the surface morphology of the iridium layer.When the concentration is low,too thin iridium layer is formed,resulting in peeling or cracking.Therefore,an appropriate increase in the concentration of the precursors will help to improve the quatity of the lr layer.In a certain range of pH values,the surface morphologies of the iridium layers prepared on different conditions are nearly the same.The surface is smooth and iridium particles ate uniform and dense.Current density has great influence on the surface morphology of the iridium layer,especially on the size and the density of crystalline particle.The iridium layer cannot be deposited at low solution temperature.Whereas the iridium layer is rough and its surface morphology is uneven at too high temperature.