光子学报
光子學報
광자학보
ACTA PHOTONICA SINICA
2009年
12期
3209-3213
,共5页
张韬%陶世荃%翟千里%宋伟
張韜%陶世荃%翟韆裏%宋偉
장도%도세전%적천리%송위
全息存储%光致聚合物%全息光栅
全息存儲%光緻聚閤物%全息光柵
전식존저%광치취합물%전식광책
Holographic storage%Photopolymer%Holographic grating
根据光致聚合物记录机理,研究了不同记录方式对光栅衍射效率的影响.对已有的光致聚合物光栅形成的一阶扩散模型进行简化,求解出全息曝光、暗增长、均匀后曝光过程对应的折射率调制度的解析式.应用所得解析结果,对三种记录方式在不同光强下的折射率调制度动态进行数值模拟.采用蓝敏光致聚合物,分别在4 mW/cm~2和2 mW/cm~2光强下应用不同方式记录光栅,结果表明:如果曝光光强较高,暗增长的记录方式将获得相对高的饱和折射率调制度,而均匀后曝光会加速达到饱和的进程.
根據光緻聚閤物記錄機理,研究瞭不同記錄方式對光柵衍射效率的影響.對已有的光緻聚閤物光柵形成的一階擴散模型進行簡化,求解齣全息曝光、暗增長、均勻後曝光過程對應的摺射率調製度的解析式.應用所得解析結果,對三種記錄方式在不同光彊下的摺射率調製度動態進行數值模擬.採用藍敏光緻聚閤物,分彆在4 mW/cm~2和2 mW/cm~2光彊下應用不同方式記錄光柵,結果錶明:如果曝光光彊較高,暗增長的記錄方式將穫得相對高的飽和摺射率調製度,而均勻後曝光會加速達到飽和的進程.
근거광치취합물기록궤리,연구료불동기록방식대광책연사효솔적영향.대이유적광치취합물광책형성적일계확산모형진행간화,구해출전식폭광、암증장、균균후폭광과정대응적절사솔조제도적해석식.응용소득해석결과,대삼충기록방식재불동광강하적절사솔조제도동태진행수치모의.채용람민광치취합물,분별재4 mW/cm~2화2 mW/cm~2광강하응용불동방식기록광책,결과표명:여과폭광광강교고,암증장적기록방식장획득상대고적포화절사솔조제도,이균균후폭광회가속체도포화적진정.
Based on the recording mechanism of photopolymer,the effect of different recording modes on the diffraction efficiency of gratings was investigated.The existing first-harmonic diffusion model of grating formation in photopolymer was simplified,then the analytic expressions of refractive index modulation for holographic exposure,dark enhancement and uniform post-exposure were educed.The kinetics of refractive index modulation for these three recording modes under different exposure intensities were numerically simulated by using the analytic expressions.Experiments were done in a new blue-sensitized photopolymer material.The gratings were recorded by different recording modes with exposure intensities of 4 mW/cm~2 and 2 mW/cm~2 respectively.The results showed that if the intensity was high,the dark enhancement mode yielded to a high saturated refractive index modulation,while uniform post-exposure made the course of saturation fast.