电子回旋共振CF4+O2等离子体中Si3N4刻蚀工艺研究
전자회선공진CF4+O2등리자체중Si3N4각식공예연구
Sub-Micron Etching of Si3N4 films by Electron Cyclotron Resonance Plasema of CF4 and O2 Gases
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