应用光学
應用光學
응용광학
JOURNAL OF APPLIED OPTICS
2010年
2期
317-321
,共5页
张睿智%付秀华%牟光远%唐吉龙
張睿智%付秀華%牟光遠%唐吉龍
장예지%부수화%모광원%당길룡
紫外低通滤光片%考夫曼离子源%电子束蒸发%材料吸收
紫外低通濾光片%攷伕曼離子源%電子束蒸髮%材料吸收
자외저통려광편%고부만리자원%전자속증발%재료흡수
UV low-pass filter%Kaufman ion source%electron beam evaporation%material absorption
根据紫外光学系统的设计要求,在K9基底上研制了254 nm高反射率、可见光谱区高透过率的低通滤光片.根据膜系设计理论,通过针法优化,获得了干涉型低通滤光片的膜系;对电子束蒸镀HfO_2和MgF_2材料进行了研究,解决了材料喷溅的问题,减少了薄膜的吸收;采用考夫曼离子源,通过优化工艺参数,提高膜层致密性,解决了光谱曲线漂移的问题,改善了成膜质量.
根據紫外光學繫統的設計要求,在K9基底上研製瞭254 nm高反射率、可見光譜區高透過率的低通濾光片.根據膜繫設計理論,通過針法優化,穫得瞭榦涉型低通濾光片的膜繫;對電子束蒸鍍HfO_2和MgF_2材料進行瞭研究,解決瞭材料噴濺的問題,減少瞭薄膜的吸收;採用攷伕曼離子源,通過優化工藝參數,提高膜層緻密性,解決瞭光譜麯線漂移的問題,改善瞭成膜質量.
근거자외광학계통적설계요구,재K9기저상연제료254 nm고반사솔、가견광보구고투과솔적저통려광편.근거막계설계이론,통과침법우화,획득료간섭형저통려광편적막계;대전자속증도HfO_2화MgF_2재료진행료연구,해결료재료분천적문제,감소료박막적흡수;채용고부만리자원,통과우화공예삼수,제고막층치밀성,해결료광보곡선표이적문제,개선료성막질량.
According to the designed requirements of UV systems, a low-pass filter was studied and developed on K9 glass substrates with high reflectivity at 254 nm and high transmittance in visible spectrum. According to the film designed theory, low-pass interference filter film was obtained by optimizing Needle method. The electron-beam evaporation materials of HfO_2 and MgF_2 were studied. The splash was solved and the absorption was decreased. By using Kaufman ion source, the film density was improved, the drift of spectral curves was solved and the quality of the film was improved by optimizing the process parameters.