CAJ | 학술논문

过去对采用脉冲电镀法制备纳米孪晶镍镀层研究较少.以镍镀层的耐腐蚀性能作为镀层性能的检测指标,应用正交试验设计优化了脉冲电镀工艺,制备出纳米孪晶镍镀层.结果表明:以主盐NiSO4·2H2O浓度为400 g/L,脉冲平均电流密度为1.5 A/dm2,占空比为20%制备的纳米孪晶镍镀层的耐腐蚀性能最好,维钝电流密度达到0.67 μA/cm2;镀层为纳米孪晶结构晶粒,尺寸为50～150 nm.
과거대채용맥충전도법제비납미련정얼도층연구교소.이얼도층적내부식성능작위도층성능적검측지표,응용정교시험설계우화료맥충전도공예,제비출납미련정얼도층.결과표명:이주염NiSO4·2H2O농도위400 g/L,맥충평균전류밀도위1.5 A/dm2,점공비위20%제비적납미련정얼도층적내부식성능최호,유둔전류밀도체도0.67 μA/cm2;도층위납미련정결구정립,척촌위50～150 nm.
Nanoscale twin crystal Ni coating was prepared using pulsed elec-trodeposition technique. The pulsed electrodeposition technique was optimized by making use of orthogonal test, using the corro-sion resistance of the coating as a criterion for quality control. Results indicate that the nickel coating deposited at a concentra-tion of main ingredient CuSO4 · 6H2O of 400 g/L, an average pulse current density of 1.5 A/dm2, and a duty cycle of 20% has the best corrosion resistance. The coating has a passive current density of as low as 0. 67 μA/cm2, and nanoscale twin crystal microstructure with a grain size of about 50 ～ 150 nm.