半导体技术
半導體技術
반도체기술
SEMICONDUCTOR TECHNOLOGY
2009年
8期
763-766
,共4页
闫立华%Xu Huiwu%徐会武%张静%李学颜
閆立華%Xu Huiwu%徐會武%張靜%李學顏
염립화%Xu Huiwu%서회무%장정%리학안
铟焊料%电镀%半导体激光器%晶粒尺度%镀层厚度%镀液%pH值
銦銲料%電鍍%半導體激光器%晶粒呎度%鍍層厚度%鍍液%pH值
인한료%전도%반도체격광기%정립척도%도층후도%도액%pH치
indium solder%electroplating%LD%grain size%depositing thickness%bath%pH valueEEACC: 2550
研究了In焊料的电镀制备方法和制备过程,分析了In焊料电镀过程中出现的镀层覆盖不完全、焊料晶粒尺度大、焊料熔化后气孔较多、凝固后表面不均匀等问题的起因,并针对这些问题,作了相应的实验改进.通过调整镀液的pH值,优化电镀电流、添加光亮剂等方法,深入讨论并得到了直流、脉冲两种电镀方式下的电镀条件,实现了稳定可控的镀速和相对较小的焊料晶粒,在半导体激光器工业的焊料制备方面具有实践意义.
研究瞭In銲料的電鍍製備方法和製備過程,分析瞭In銲料電鍍過程中齣現的鍍層覆蓋不完全、銲料晶粒呎度大、銲料鎔化後氣孔較多、凝固後錶麵不均勻等問題的起因,併針對這些問題,作瞭相應的實驗改進.通過調整鍍液的pH值,優化電鍍電流、添加光亮劑等方法,深入討論併得到瞭直流、脈遲兩種電鍍方式下的電鍍條件,實現瞭穩定可控的鍍速和相對較小的銲料晶粒,在半導體激光器工業的銲料製備方麵具有實踐意義.
연구료In한료적전도제비방법화제비과정,분석료In한료전도과정중출현적도층복개불완전、한료정립척도대、한료용화후기공교다、응고후표면불균균등문제적기인,병침대저사문제,작료상응적실험개진.통과조정도액적pH치,우화전도전류、첨가광량제등방법,심입토론병득도료직류、맥충량충전도방식하적전도조건,실현료은정가공적도속화상대교소적한료정립,재반도체격광기공업적한료제비방면구유실천의의.
The In electroplating techniques and fabrication process were summarized. Some serious phenomena such as the coverage ability, electroplating grain size, the gas separating out being melted and the flatness after solidification were investigated. With the related issues of In electroplating, many concerns including the bath pH value, current form and density, bath organic chemicals were analyzed. The final proper plating conditions, capability of controlling the depositing thickness and the relative small size of the deposition grains were obtained. It reveals that this method is of good feasibility in the diode package industry.