量子电子学报
量子電子學報
양자전자학보
CHINESE JOURNAL OF QUANTUM ELECTRONICS
2011年
2期
247-252
,共6页
邵景珍%董伟伟%陶汝华%邓赞红%周曙%方晓东
邵景珍%董偉偉%陶汝華%鄧讚紅%週曙%方曉東
소경진%동위위%도여화%산찬홍%주서%방효동
材料%光电特性%溶胶凝胶法%钼掺杂氧化锌%透明导电氧化物
材料%光電特性%溶膠凝膠法%鉬摻雜氧化鋅%透明導電氧化物
재료%광전특성%용효응효법%목참잡양화자%투명도전양화물
materials%photoelectric properties%sol-gel spin coating method%Mo-doped zinc oxide%transparent conducting oxides
利用溶胶凝胶法在Al2O3衬底上制备出了c轴择优取向的钼掺杂氧化锌(MZO)透明导电薄膜,研究了钼的掺杂量(0~1 at%)对钼掺杂氧化锌薄膜光电性能的影响.研究结果表明:所制备的薄膜为六方纤锌矿型结构且表面平整、致密.通过高温真空退火,MZO薄膜的电阻率明显降低.且随着钼含量的增加,MZO薄膜的电阻率呈现出先减小后增大的趋势,当钼含量为0.4at%时,获得最小电阻率为0.13 Ωcm.薄膜在近红外区域(800~2000 nm)的平均透过率大于85%,这可以有效地拓宽光电器件的光谱范围.
利用溶膠凝膠法在Al2O3襯底上製備齣瞭c軸擇優取嚮的鉬摻雜氧化鋅(MZO)透明導電薄膜,研究瞭鉬的摻雜量(0~1 at%)對鉬摻雜氧化鋅薄膜光電性能的影響.研究結果錶明:所製備的薄膜為六方纖鋅礦型結構且錶麵平整、緻密.通過高溫真空退火,MZO薄膜的電阻率明顯降低.且隨著鉬含量的增加,MZO薄膜的電阻率呈現齣先減小後增大的趨勢,噹鉬含量為0.4at%時,穫得最小電阻率為0.13 Ωcm.薄膜在近紅外區域(800~2000 nm)的平均透過率大于85%,這可以有效地拓寬光電器件的光譜範圍.
이용용효응효법재Al2O3츤저상제비출료c축택우취향적목참잡양화자(MZO)투명도전박막,연구료목적참잡량(0~1 at%)대목참잡양화자박막광전성능적영향.연구결과표명:소제비적박막위륙방섬자광형결구차표면평정、치밀.통과고온진공퇴화,MZO박막적전조솔명현강저.차수착목함량적증가,MZO박막적전조솔정현출선감소후증대적추세,당목함량위0.4at%시,획득최소전조솔위0.13 Ωcm.박막재근홍외구역(800~2000 nm)적평균투과솔대우85%,저가이유효지탁관광전기건적광보범위.
Mo-doped ZnO (MZO) films with different Mo concentration (0~1 at%) were prepared on Al2O3(0001) substrates by sol-gel spin coating route. It was found that the MZO films with ZnO hexagonal wurtzite structure were highly c-axis orientation. The electrical properties of MZO films can be significantly improved by the heat-treatment in vacuum. The resistivity of the films initially decreases with the increase of Mocontent and then gradually increases with a further increase of Mo content. The lowest resistivity of 0.13 Ωcm was obtained at a Mo content of 0.4 at%. The carrier concentration and Hall mobility were measured and discussed to understand the electrical transport characteristics. The high average transmittance (>85%)in near-infrared region (800~2000 nm) indicates the possible use of MZO films in photoelectric device can widen absorption spectrum range.