CAJ | 학술논문

采用磁控溅射法在Ti6A14V钛合金基体上制备羟基磷灰石(HA)-氧化锆(ZrO2)复合涂层,通过SEM、EDS、XRD和划痕法对50HA-50ZrO2和75HA-25ZrO2(质量分数,％)涂层进行表征,分析HA含量对涂层残余应力的影响.实验结果表明,HA-ZrO2复合涂层的物相为HA、ZrO2和Y2O3,在复合过程中HA部分发生分解,产生TCP和CaO等杂质相；涂层表面呈多孔状,有利于类骨组织的生长,50HA-50ZrO2和75HA-25ZrO2深层的表面粗糙度分别为1.61μm和2.92 μm;涂层结合界面为机械结合方式,划痕法测量的50HA-50ZrO2和75HA-25ZrO2深层界面结合强度分别为30 N和17.5 N,随着HA含量的增加,涂层结合强度呈现下降的趋势；50HA-50ZrO2和75HA-25ZrO2涂层的残余应力分别为(-399.1±3)MPa和(-343.2±20.3) MPa,适当增加HA可以减小涂层的残余应力.
채용자공천사법재Ti6A14V태합금기체상제비간기린회석(HA)-양화고(ZrO2)복합도층,통과SEM、EDS、XRD화화흔법대50HA-50ZrO2화75HA-25ZrO2(질량분수,％)도층진행표정,분석HA함량대도층잔여응력적영향.실험결과표명,HA-ZrO2복합도층적물상위HA、ZrO2화Y2O3,재복합과정중HA부분발생분해,산생TCP화CaO등잡질상；도층표면정다공상,유리우류골조직적생장,50HA-50ZrO2화75HA-25ZrO2심층적표면조조도분별위1.61μm화2.92 μm;도층결합계면위궤계결합방식,화흔법측량적50HA-50ZrO2화75HA-25ZrO2심층계면결합강도분별위30 N화17.5 N,수착HA함량적증가,도층결합강도정현하강적추세；50HA-50ZrO2화75HA-25ZrO2도층적잔여응력분별위(-399.1±3)MPa화(-343.2±20.3) MPa,괄당증가HA가이감소도층적잔여응력.
Hydroxyapatite (HA)-zirconium (ZrO2) composite coating was produced by magnetic sputtering on Ti6A14V titanium alloy substrate,the coatings of 50HA-50ZrO2 and 75HA-25ZrO2 (mass fraction,％) were characterized by scanning electron microscopy,energy disperse spectroscopy,X-ray diffraction and scratch test,respectively,and the effects of HA contents in the coating on residual stress were analyzed.The experimental results show that the phases of HA-ZrO2 composite coatings are HA,ZrO2 and Y2O3,and the HA has a certain decomposition in the combination process,producing TCP and CaO impurity phases.The porous surface of coating is conducive to the growth of bone tissue,and the surface roughness values of 50HA-50ZrO2 and 75HA-25ZrO2 are 1.61 μm and 2.92 tm,respectively.The coating interface is of mechanical integration,the bonding strength values of 50HA-50ZrO2 and 75HA-25ZrO2 are 30 N and 17.5 N,respectively,showing a downward trend with the HA contents increasing.The residual stress values in the coating of 50HA-50ZrO2 and 75HA-25ZrO2 are (-399.1±3.0) MPa,(-343.2±20.3) MPa,respectively,as a result,the appropriate increase of HA contents in the coating will reduce its residual stress.