CAJ | 학술논문

应用低能电子束进行辐照加工需要采用自屏蔽结构来达到辐射防护的要求.自屏蔽防护层的功能是屏蔽由轫致辐射产生的光子.本工作利用蒙特卡罗应用程序EGSnrcMP模拟了低能电子束轰击钢和聚乙烯两种靶材的轫致辐射过程,比较和分析了轫致辐射反射光子的能谱及角分布与靶材料种类、靶材料厚度之间的关系,为优化设计自屏蔽结构提供了基础数据.
응용저능전자속진행복조가공수요채용자병폐결구래체도복사방호적요구.자병폐방호층적공능시병폐유인치복사산생적광자.본공작이용몽특잡라응용정서EGSnrcMP모의료저능전자속굉격강화취을희량충파재적인치복사과정,비교화분석료인치복사반사광자적능보급각분포여파재료충류、파재료후도지간적관계,위우화설계자병폐결구제공료기출수거.
The radiation protection in radiation processing with low energy electron beam is generally achieved by applying self-shielding. The self-shielding layers should shield bremsstrahlung photons effectively. The brem-sstrahlung of low energy electrons striking on steel and polyethylene has been simulated with Monte Carlo system EGSnrcMP. The relations between the energy spectra, angular distributions of bremsstrahlung photons and target ma-terials and depths are analyzed and discussed. The basic data can be used to optimize the self-shielding design.