大学物理实验
大學物理實驗
대학물리실험
PHYSICAL EXPERIMENT OF COLLEGE
2011年
4期
22-25
,共4页
发射率%基底材料%镀膜仪%红外热像仪
髮射率%基底材料%鍍膜儀%紅外熱像儀
발사솔%기저재료%도막의%홍외열상의
emissivity%backing material%auto sputter coater%infrared thermal imaging
介绍了镀膜技术和红外热像仪测量镀膜材料发射率的方法,并利用红外热像法分析了基底材料对薄膜发射率的影响。通过实验研究了镀膜时间与膜厚度变化导致的测量波段发射率的变化关系。
介紹瞭鍍膜技術和紅外熱像儀測量鍍膜材料髮射率的方法,併利用紅外熱像法分析瞭基底材料對薄膜髮射率的影響。通過實驗研究瞭鍍膜時間與膜厚度變化導緻的測量波段髮射率的變化關繫。
개소료도막기술화홍외열상의측량도막재료발사솔적방법,병이용홍외열상법분석료기저재료대박막발사솔적영향。통과실험연구료도막시간여막후도변화도치적측량파단발사솔적변화관계。
The method of measuring the emissivity of the coating material with thermal infrared imager as well as coating technology was introduced;the influence of backing material on emissivity of thin film was analyzed.By experiment,the change of measured wavelength induced by coating time and the thickness of thin film was studied.
