发光学报
髮光學報
발광학보
CHINESE JOURNAL OF LUMINESCENCE
2005年
6期
737-742
,共6页
黄永辉%李宏建%代国章%谢强%潘艳芝%戴小玉
黃永輝%李宏建%代國章%謝彊%潘豔芝%戴小玉
황영휘%리굉건%대국장%사강%반염지%대소옥
有机电致发光器件%电极修饰%界面偶极子
有機電緻髮光器件%電極脩飾%界麵偶極子
유궤전치발광기건%전겁수식%계면우겁자
OLEDs%electrode modification%interface dipole
提出了用一种无机半导体的模型来计算有机电致发光器件(OELDs)的J-V特性.通过在金属/有机物界面插入薄LiF层,由此引入的偶极子能极大地降低了电子的注入势垒和OELDs的开启电压.从而,载流子的注入得到了平衡,OELDs的性能得到了较大提高.经过数值计算,发现LiF插入层有一个约为1.5~5.0 nm的最优厚度.LiF层太厚或太薄都会提高器件的开启电压、降低器件的性能.结果表明:这一模型可以用来解释OELD通过LiF修饰阴极后性能的提高.
提齣瞭用一種無機半導體的模型來計算有機電緻髮光器件(OELDs)的J-V特性.通過在金屬/有機物界麵插入薄LiF層,由此引入的偶極子能極大地降低瞭電子的註入勢壘和OELDs的開啟電壓.從而,載流子的註入得到瞭平衡,OELDs的性能得到瞭較大提高.經過數值計算,髮現LiF插入層有一箇約為1.5~5.0 nm的最優厚度.LiF層太厚或太薄都會提高器件的開啟電壓、降低器件的性能.結果錶明:這一模型可以用來解釋OELD通過LiF脩飾陰極後性能的提高.
제출료용일충무궤반도체적모형래계산유궤전치발광기건(OELDs)적J-V특성.통과재금속/유궤물계면삽입박LiF층,유차인입적우겁자능겁대지강저료전자적주입세루화OELDs적개계전압.종이,재류자적주입득도료평형,OELDs적성능득도료교대제고.경과수치계산,발현LiF삽입층유일개약위1.5~5.0 nm적최우후도.LiF층태후혹태박도회제고기건적개계전압、강저기건적성능.결과표명:저일모형가이용래해석OELD통과LiF수식음겁후성능적제고.
A model for inorganic semiconductor has been presented to calculate the J-V characteristics of organic electroluminescent devices (OELDs). The additional dipole energy introduced by inserting a thin LiF layer at metal/organic interface significantly decreases the potential barrier for electrons injection and the turn-on voltage of OELD. The charge carriers injection has been balanced, and then the performance of OELD has been greatly enhanced. By detailed numerical calculation, it has been found that the optimal thickness of inserted LiF should be in the range of 1.5~5.0 nm, too thick or too thin LiF will increase the turn-on voltage of OELD and degrade its performance. It has been proved that this model is proper to explain the performance enhancement of OELDs via modification of electrode with LiF.