CAJ | 학술논문

　　制备一种纳米氧化硅抛光液，采用扫描电子显微镜、激光粒度仪、颗粒计数仪等对其物性参数进行表征；使用该抛光液对LED蓝宝石衬底进行机械化学抛光，采用轮廓仪、表面缺陷检测设备、原子力显微镜等对抛光后的蓝宝石衬底表面进行表征。结果表明，制备的纳米氧化硅抛光液对LED蓝宝石衬底具有优异的抛光性能，抛光后的表面无划伤、无腐蚀坑，且粗糙度小于0.2 nm。
　　제비일충납미양화규포광액，채용소묘전자현미경、격광립도의、과립계수의등대기물성삼수진행표정；사용해포광액대LED람보석츤저진행궤계화학포광，채용륜곽의、표면결함검측설비、원자력현미경등대포광후적람보석츤저표면진행표정。결과표명，제비적납미양화규포광액대LED람보석츤저구유우이적포광성능，포광후적표면무화상、무부식갱，차조조도소우0.2 nm。
To meet the ultra-precision machining requirement of single-crystal sapphire substrate for advanced electronic products,such as LED,one kind of silica-based slurries was prepared and its properties were investigated by scanning electronic microscope (SEM),Laser particle size analyzer and particle counting instrument. The polishing performance of as-prepared slurry on LED sapphire substrate was studied,and the polished sapphire surface was inspected by FRT profilometer,Candela optical surface analyzer (OSA),and atomic force microscope (AFM). The results indicate that as-prepared slurry exhibits excellent polishing performance and the average roughness of obtained sapphire surface without scratch and pit is below 0.2 nm.