原子能科学技术
原子能科學技術
원자능과학기술
ATOMIC ENERGY SCIENCE AND TECHNOLOGY
2014年
5期
955-960
,共6页
刘艳松%何智兵%李俊%许华
劉豔鬆%何智兵%李俊%許華
류염송%하지병%리준%허화
磁控溅射%金属涂层%成分渐变%双壳层靶%惯性约束聚变
磁控濺射%金屬塗層%成分漸變%雙殼層靶%慣性約束聚變
자공천사%금속도층%성분점변%쌍각층파%관성약속취변
magnetron sputtering%metal coating%gradient composition%double shell target%inertial confinement fusion
在JG P560型高真空多功能磁控溅射设备上,利用直流磁控溅射法,通过控制共溅射时A u靶和Cu靶的功率变化,在平面基片和微球表面制备了一系列成分渐变的Au/Cu涂层,并用扫描电子显微镜和能量色散X射线荧光光谱仪对涂层的微观结构和成分进行了测试分析。分析结果表明:涂层内部的晶粒生长随Au和Cu含量的变化呈现出3个不同的区域;涂层中Au和Cu含量随涂层厚度的增加呈近线性变化的趋势;涂层内部晶粒之间结合紧密;涂层厚度均匀性良好,表面光洁。
在JG P560型高真空多功能磁控濺射設備上,利用直流磁控濺射法,通過控製共濺射時A u靶和Cu靶的功率變化,在平麵基片和微毬錶麵製備瞭一繫列成分漸變的Au/Cu塗層,併用掃描電子顯微鏡和能量色散X射線熒光光譜儀對塗層的微觀結構和成分進行瞭測試分析。分析結果錶明:塗層內部的晶粒生長隨Au和Cu含量的變化呈現齣3箇不同的區域;塗層中Au和Cu含量隨塗層厚度的增加呈近線性變化的趨勢;塗層內部晶粒之間結閤緊密;塗層厚度均勻性良好,錶麵光潔。
재JG P560형고진공다공능자공천사설비상,이용직류자공천사법,통과공제공천사시A u파화Cu파적공솔변화,재평면기편화미구표면제비료일계렬성분점변적Au/Cu도층,병용소묘전자현미경화능량색산X사선형광광보의대도층적미관결구화성분진행료측시분석。분석결과표명:도층내부적정립생장수Au화Cu함량적변화정현출3개불동적구역;도층중Au화Cu함량수도층후도적증가정근선성변화적추세;도층내부정립지간결합긴밀;도층후도균균성량호,표면광길。
Au/Cu bimetallic alloy coatings were prepared by direct current (DC) magne-tron sputtering on the surfaces of Si substrates and glow discharge polymer (GDP ) microspheres .The compositions of Au and Cu in Au/Cu alloy coating were controlled by tuning the sputting power of Au target and Cu target during the sputtering process . Scanning electron microscope (SEM ) and energy disperse spectroscopy (EDS ) were used to examine the structure ,roughness ,density and composition of the coatings .T he results indicate that the compositions of Au and Cu change nearly linearly with the increase of the coating thickness .The surface roughness of the coating is good and the thicknesses of all the coatings are almost the same .The coating shows highly packed microstructures ,with no interspaces between different grains .