CAJ | 학술논문

　　采用溶胶凝胶法在LiNaO3（LNO）衬底上制备Na0.5Bi0.5TiO3（NBT）薄膜.部分NBT薄膜在氮气氛围下进行了热处理，记为NBT-N2.在100~400 K的温度范围内，测量了NBT-N2的介电性能. NBT-N2薄膜的介电频谱中出现了损耗峰，存在弛豫现象.利用Arrhenius公式拟合弛豫所对应的激活能，发现在NBT-N2薄膜中存在2个热激活过程：一个对应氧空位电离引入的极化子的跳跃跃迁；另一个对应导电电子与偏离氧八面体中心的Ti离子之间的耦合.此外，采用复阻抗谱分析了NBT-N2薄膜中的介电弛豫过程，在测试温度范围内，随着温度的升高，该弛豫过程逐渐趋向于理想的德拜模型.
　　채용용효응효법재LiNaO3（LNO）츤저상제비Na0.5Bi0.5TiO3（NBT）박막.부분NBT박막재담기분위하진행료열처리，기위NBT-N2.재100~400 K적온도범위내，측량료NBT-N2적개전성능. NBT-N2박막적개전빈보중출현료손모봉，존재이예현상.이용Arrhenius공식의합이예소대응적격활능，발현재NBT-N2박막중존재2개열격활과정：일개대응양공위전리인입적겁화자적도약약천；령일개대응도전전자여편리양팔면체중심적Ti리자지간적우합.차외，채용복조항보분석료NBT-N2박막중적개전이예과정，재측시온도범위내，수착온도적승고，해이예과정축점추향우이상적덕배모형.
Na0.5Bi0.5TiO3 (NBT) thin films were prepared on LaNiO3-coated substrate by sol-gel method. Parts of NBT films were treated in N2 atmosphere, donating as NBT-N2. The dielectric properties of NBT-N2 films were measured in the temperature range of 100~400 K. The results show that NBT-N2 film exhibits a loss peak in the frequency dependence of dielectric loss, indicating a Debye-like relaxation. The activation energy for the relaxation is fitted using Arrhenius law. The fitting results imply that there are two thermally activated processes in the NBT-N2 thin film, which are ascribed to polarons induced from the formation of oxygen vacancies and the coupling effect between the conducting electrons and the off-center Ti ions, respectively. Meanwhile, the dielectric response is plotted in complex permittivity plane to analyze the relaxation process. In the measured temperature range, the relaxation process shows a trend to the ideal Debye model with increasing temperature.