含能材料
含能材料
함능재료
ENERGETIC MATERIALS
2013年
6期
734-737
,共4页
赵娜%沈金朋%李瑞%杨光成%黄辉
趙娜%瀋金朋%李瑞%楊光成%黃輝
조나%침금붕%리서%양광성%황휘
应用化学%含能材料%Al/MoO3%亚稳态分子间复合物(MIC)%火焰法
應用化學%含能材料%Al/MoO3%亞穩態分子間複閤物(MIC)%火燄法
응용화학%함능재료%Al/MoO3%아은태분자간복합물(MIC)%화염법
applied chemistry%energetic materials%Al/MoO3%metastable intermolecular composites(MIC)%flame method
亚稳态分子间复合物(MIC)阵列由于具有高能量密度、小尺寸条件下能自持反应的优点,在集成化火工品方面具有潜在的应用价值。采用火焰法在硅基底上原位制备了高度有序的MoO3纳米片阵列,探讨了基底材料、纳米阵列生长时间、火焰源因素对生成MoO3形貌的影响,得到了MoO3纳米片阵列的优化制备工艺条件:以硅片为基底,生长时间为5 min和甲烷为火焰源。制备的纳米片厚度为100~200 nm,宽度约5μm,长度达到十几个微米。分别采用磁控溅射和热蒸发在MoO3纳米片阵列表面镀铝得到Al/MoO3 MIC阵列,在铝膜厚度相同的情况下,采用热蒸发镀铝方式优于磁控溅射。热蒸发铝膜厚度为900 nm时,所获得的Al/MoO3 MIC阵列具有较高的放热量,达到3276 J? g-1。
亞穩態分子間複閤物(MIC)陣列由于具有高能量密度、小呎吋條件下能自持反應的優點,在集成化火工品方麵具有潛在的應用價值。採用火燄法在硅基底上原位製備瞭高度有序的MoO3納米片陣列,探討瞭基底材料、納米陣列生長時間、火燄源因素對生成MoO3形貌的影響,得到瞭MoO3納米片陣列的優化製備工藝條件:以硅片為基底,生長時間為5 min和甲烷為火燄源。製備的納米片厚度為100~200 nm,寬度約5μm,長度達到十幾箇微米。分彆採用磁控濺射和熱蒸髮在MoO3納米片陣列錶麵鍍鋁得到Al/MoO3 MIC陣列,在鋁膜厚度相同的情況下,採用熱蒸髮鍍鋁方式優于磁控濺射。熱蒸髮鋁膜厚度為900 nm時,所穫得的Al/MoO3 MIC陣列具有較高的放熱量,達到3276 J? g-1。
아은태분자간복합물(MIC)진렬유우구유고능량밀도、소척촌조건하능자지반응적우점,재집성화화공품방면구유잠재적응용개치。채용화염법재규기저상원위제비료고도유서적MoO3납미편진렬,탐토료기저재료、납미진렬생장시간、화염원인소대생성MoO3형모적영향,득도료MoO3납미편진렬적우화제비공예조건:이규편위기저,생장시간위5 min화갑완위화염원。제비적납미편후도위100~200 nm,관도약5μm,장도체도십궤개미미。분별채용자공천사화열증발재MoO3납미편진렬표면도려득도Al/MoO3 MIC진렬,재려막후도상동적정황하,채용열증발도려방식우우자공천사。열증발려막후도위900 nm시,소획득적Al/MoO3 MIC진렬구유교고적방열량,체도3276 J? g-1。
With high energy density and self-sustained combustion under the condition of small size, metastable intermolecular composites (MIC) array has potential value in the application of intergrated initiating explosive devices.In the current study, high-ly ordered MoO3 nanobelts array was prepared by a flame method.The possible factors which may influence the morphology of MoO3 nanobelts, such as different substrate, growing time, and the flame source, were also studied.The optimal conditions for growing MoO3 nanobelts array were obtained as follows: utilizing Si as the substrate and CH4 gas as the flame source with the growing time of 5 min.The as-synthesized MoO3 nanobelts possess a thickness of ~5 nm, a width of ~5μm, and a length larger than 10 μm.And then MIC-Al/MoO3 array was prepared by aluminum plating on the surface of MoO3 nanobelts via the magne-tron sputtering and thermal evaporation method respectively.The results show that MIC-Al/MoO3 fabricated by thermal evapora-tion method has higher heat release (3276 J? g-1 ) compared that by the magnetron sputtering method with the same aluminum film thickness.