CAJ | 학술논문

通过磁控溅射镀膜法制备了不同厚度的钴薄膜，利用飞秒激光泵浦探测技术研究了衬底材料分别为单晶硅、K9玻璃以及 Tou 玻璃的钴薄膜内部的超快动力学变化。实验结果表明，当用80mW的泵浦激光脉冲加热不同厚度、不同衬底的钴膜时，电子的加热时间不变，均为0.1344ps；而电子的热化时间则会发生变化，且与薄膜厚度和衬底材料均有关。在电-声子发生非平衡弛豫阶段，对于不同衬底材料的钴膜，其瞬态反射率曲线的变化趋势也不同。
통과자공천사도막법제비료불동후도적고박막，이용비초격광빙포탐측기술연구료츤저재료분별위단정규、K9파리이급 Tou 파리적고박막내부적초쾌동역학변화。실험결과표명，당용80mW적빙포격광맥충가열불동후도、불동츤저적고막시，전자적가열시간불변，균위0.1344ps；이전자적열화시간칙회발생변화，차여박막후도화츤저재료균유관。재전-성자발생비평형이예계단，대우불동츤저재료적고막，기순태반사솔곡선적변화추세야불동。
Cobalt films were deposited on silicon substrates,K9 glass substrates and Tou glass substrates,sepa-rately,by magnetron sputtering technique.The ultrafast dynamics of Co films were studied by using femtosec-ond laser pump-probe technology.The results show that,when the pumped power of femtosecond laser pulse was 80mW,and both the substrates and the thickness of cobalt films were not the same,the heating time of electrons in films was equal,was 0.1344ps;however the thermalized time of electrons in films was diverse,it was relative to the thickness and the substrates of Co films.Besides,when the substrates of Co films were changed,during the nonequilibrium lasting time of electrons,the transient reflectance curves were different.