CAJ | 학술논문

采用常温直流磁控溅射法在廉价201无镍不锈钢表面沉积了纯钛薄膜.通过XRD和SEM分析了201上钛薄膜的结构和形态受沉积条件的影响.结果表明，在溅射功率为78.4 W时钛薄膜由紧密排列的柱状晶构成，但功率过大薄膜反而疏松.多种工艺参数下，钛薄膜具有高度的择优取向，但其择优取向的晶面并不固定.XRD结果还表明：由于钛原子的渗入，基底会发生较严重的晶格畸变.并探讨了以沉积量表征膜厚的可能性及工艺参数对薄膜沉积量的影响.
채용상온직류자공천사법재렴개201무얼불수강표면침적료순태박막.통과XRD화SEM분석료201상태박막적결구화형태수침적조건적영향.결과표명，재천사공솔위78.4 W시태박막유긴밀배렬적주상정구성，단공솔과대박막반이소송.다충공예삼수하，태박막구유고도적택우취향，단기택우취향적정면병불고정.XRD결과환표명：유우태원자적삼입，기저회발생교엄중적정격기변.병탐토료이침적량표정막후적가능성급공예삼수대박막침적량적영향.
Ti film was deposited at the room temperature by DC magnetron sputtering on low-cost 201 stainless steel free of Ni. The effects of deposition conditions on the structure and appearance of Ti film on 201 stainless steel were analyzed through XRD and SEM. The results showed that the film microstructure was closely correlated with the deposition parameters. The closely aligned cyberlink crystal was observed at 78.4 W of sputtering power, but porosity was being produced at stronger power. High orientation was determined by XRD but lattice plane with the orientation was not exclusive with different variable process parameters. It was also determined by XRD that the more serious lattice distortion of the base was found because of Ti atom infiltration. Moreover, the possibility that the film thickness could be characterized by the deposition quantity and the effects of parameters on the deposition quantity were also discussed.