中国有色金属学报(英文版)
中國有色金屬學報(英文版)
중국유색금속학보(영문판)
TRANSACTIONS OF NONFERROUS METALS SOCIETY OF CHINA
2013年
8期
2431-2438
,共8页
电化学机械平坦化%5-methyl-1H-benzotriazole%腐蚀抑制剂%氯离子
電化學機械平坦化%5-methyl-1H-benzotriazole%腐蝕抑製劑%氯離子
전화학궤계평탄화%5-methyl-1H-benzotriazole%부식억제제%록리자
electrochemical-mechanical planarization%5-methyl-1H-benzotriazole%corrosion inhibitor%chloride ion
根据电化学分析,5-甲基苯并三氮唑(m-BTA)的腐蚀抑制能力要高于苯并三唑(BTA)的。当羟基乙叉二膦酸(HEDP)电解液中同时含有m-BTA及氯离子时,其抑制解离能力比只含有m-BTA的更好,即使施加更高的阳极氧化电位依然能保持良好的抑制能力。由电化学阻抗谱法、纳米划痕实验以及能谱分析结果得知,m-BTA抑制能力的提升是因为整体钝化膜厚度的增加而引起的。由X射线光电子能谱分析得知,氯离子与m-BTA钝化层形成[Cu(I)Cl(m-BTA)]n高分子化合物,使得整体钝化层厚度增加。因此,在含有m-BTA的HEDP电解液中添加氯离子有助于m-BTA钝化层抑制能力的增强,进而更有效的电位操作区间得到扩展。
根據電化學分析,5-甲基苯併三氮唑(m-BTA)的腐蝕抑製能力要高于苯併三唑(BTA)的。噹羥基乙扠二膦痠(HEDP)電解液中同時含有m-BTA及氯離子時,其抑製解離能力比隻含有m-BTA的更好,即使施加更高的暘極氧化電位依然能保持良好的抑製能力。由電化學阻抗譜法、納米劃痕實驗以及能譜分析結果得知,m-BTA抑製能力的提升是因為整體鈍化膜厚度的增加而引起的。由X射線光電子能譜分析得知,氯離子與m-BTA鈍化層形成[Cu(I)Cl(m-BTA)]n高分子化閤物,使得整體鈍化層厚度增加。因此,在含有m-BTA的HEDP電解液中添加氯離子有助于m-BTA鈍化層抑製能力的增彊,進而更有效的電位操作區間得到擴展。
근거전화학분석,5-갑기분병삼담서(m-BTA)적부식억제능력요고우분병삼서(BTA)적。당간기을차이련산(HEDP)전해액중동시함유m-BTA급록리자시,기억제해리능력비지함유m-BTA적경호,즉사시가경고적양겁양화전위의연능보지량호적억제능력。유전화학조항보법、납미화흔실험이급능보분석결과득지,m-BTA억제능력적제승시인위정체둔화막후도적증가이인기적。유X사선광전자능보분석득지,록리자여m-BTA둔화층형성[Cu(I)Cl(m-BTA)]n고분자화합물,사득정체둔화층후도증가。인차,재함유m-BTA적HEDP전해액중첨가록리자유조우m-BTA둔화층억제능력적증강,진이경유효적전위조작구간득도확전。
According to the electrochemical analysis, the corrosion inhibition efficiency of 5-methyl-1H-benzotriazole (m-BTA) is higher than that of benzotrizaole (BTA). The inhibition capability of the m-BTA passive film formed in hydroxyethylidenediphosphonic acid (HEDP) electrolyte containing both m-BTA and chloride ions is superior to that formed in m-BTA-alone electrolyte, even at a high anodic potential. The results of electrical impedance spectroscopy, nano-scratch experiments and energy dispersive analysis of X-ray (EDAX) indicate that the enhancement of m-BTA inhibition capability may be due to the increasing thickness of passive film. Furthermore, X-ray photoelectron spectrometry (XPS) analysis indicates that the increase in passive film thickness can be attributed to the incorporation of Cl? into the m-BTA passive film and the formation of [Cu(I)Cl(m-BTA)]n polymer film on Cu surface. Therefore, the introduction of Cl? into m-BTA-containing HEDP electrolyte is effective to enhance the passivation capability of m-BTA passive film, thus extending the operating potential window.