光电工程
光電工程
광전공정
OPTO-ELECTRONIC ENGINEERING
2013年
9期
68-75
,共8页
丁卫涛%黄元申%张大伟%杨海马
丁衛濤%黃元申%張大偉%楊海馬
정위도%황원신%장대위%양해마
刻划误差%误差分析%中阶梯光栅%衍射效率
刻劃誤差%誤差分析%中階梯光柵%衍射效率
각화오차%오차분석%중계제광책%연사효솔
ruling error%error analysis%echelle grating%diffraction efficiency
中阶梯光栅作为高色散和高分辨率光学器件,已经广泛的应用于大型光谱仪器之中。在中阶梯光栅的刻划过程中,存在刻划误差,这将严重影响光栅衍射性能,最终使得衍射效果产生缺陷。针对此情况,定量分析了中阶梯光栅的刻划误差对衍射光谱、衍射级次、波前误差、鬼线强度、杂散光强度的影响以及提出了一种从衍射效率角度分析刻划误差的方法。在满足一定条件下,求得上述因素对应的刻划误差分别为:1265.8 nm、352 nm、37 nm、112 nm、3.4 nm。这对光栅刻划时限定刻划机的刻划精度提供了直接和重要的参考。
中階梯光柵作為高色散和高分辨率光學器件,已經廣汎的應用于大型光譜儀器之中。在中階梯光柵的刻劃過程中,存在刻劃誤差,這將嚴重影響光柵衍射性能,最終使得衍射效果產生缺陷。針對此情況,定量分析瞭中階梯光柵的刻劃誤差對衍射光譜、衍射級次、波前誤差、鬼線彊度、雜散光彊度的影響以及提齣瞭一種從衍射效率角度分析刻劃誤差的方法。在滿足一定條件下,求得上述因素對應的刻劃誤差分彆為:1265.8 nm、352 nm、37 nm、112 nm、3.4 nm。這對光柵刻劃時限定刻劃機的刻劃精度提供瞭直接和重要的參攷。
중계제광책작위고색산화고분변솔광학기건,이경엄범적응용우대형광보의기지중。재중계제광책적각화과정중,존재각화오차,저장엄중영향광책연사성능,최종사득연사효과산생결함。침대차정황,정량분석료중계제광책적각화오차대연사광보、연사급차、파전오차、귀선강도、잡산광강도적영향이급제출료일충종연사효솔각도분석각화오차적방법。재만족일정조건하,구득상술인소대응적각화오차분별위:1265.8 nm、352 nm、37 nm、112 nm、3.4 nm。저대광책각화시한정각화궤적각화정도제공료직접화중요적삼고。
Echelle grating is used extensively in spectral instruments owing to its advantages, such as the advanced intrinsic dispersion and resolving power. But while ruling the echelle grating, there may be some periodic components of spacing errors which will seriously affect the performance of grating diffraction and lead to defects of the diffraction effects. In response to this situation, the effect of grating’s line error on diffraction spectrum, diffraction order, wavefront error, the intensity of the rowland ghost line and the intensity of stray light was proposed. What’s more, a method for analyzing the grating’s line error from the aspect of the diffraction efficiency was proposed. Under certain conditions, the ruling errors for meeting every kind of requests are 1 265.8 nm, 352 nm, 37 nm, 112 nm, 3.4 nm respectively, which provides a direct and important reference for the ruling accuracy before ruling an echelle grating.